Mask group suitable for multi-overlay multi-time sequence photoetching pattern and fabrication method of mask group

Abstract

The invention provides a mask group suitable for multi-overlay multi-time sequence photoetching pattern and a fabrication method of the mask group. The mask comprises a plurality of masks, the number of the masks is (m+1), m is overlay frequencies, a plurality of pattern regions are uniformly divided on each mask, the total area of the pattern region is equal to the surface area of the mask, the number of pattern regions is at least (m+1), a shading layer is arranged on each pattern region, transmitting patterns are formed on the shading layer, the types of the transmitting patterns are (m+1), the transmitting patterns formed on pattern region at the same position of each mask are different, (m+1) transmitting patterns at the same position of the mask is arranged to be a set of overlay group, and the overlay groups at arbitrary two corresponding positions are different. During multi-overlay process of the mask group, the sequence arrangement mode of different time sequences can be acquired without considering the processing sequence of a pattern structure, the processing flows of different time sequences are facilitated, meanwhile, the number of the masks is saved, and the cost is reduced.

Description

technical field [0001] The invention relates to the technical field of semiconductor device preparation, in particular to a mask plate group and a manufacturing method suitable for multiple overlaying and multi-sequence photolithography patterns. Background technique [0002] Photolithography technology is a technology for constructing semiconductor MOS transistors and circuits on a flat silicon wafer, and is a precise microfabrication technology. [0003] When the existing photolithography process performs multiple overlays, it generally performs processing according to a fixed processing sequence. Take the cross pattern engraved three times as an example, such as figure 1 Four kinds of cross figures (1), (2), (3) and (4) participating in the engraving process three times are shown. Such as figure 2 Four photolithographic patterns after overlaying of cross patterns are shown. Such as image 3 As shown, the mask plate is divided into a, b, c, d. In the process, the ge...

AI Technical Summary

Problems solved by technology

[0005] The present invention provides a mask group and a manufacturing method suitable for multi-sequence photolithography patterns for multiple overlaying, which are used to solve the problem that the pattern of the mask plate set in the prior art is not easy to change, resulting in difficult change of the processing sequence, and further Issues Affecting Micromachining Flexibility

Images