Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Silicon wafer texturing agent containing kelp extraction liquid and preparation method for silicon wafer texturing agent

A technology of extracting liquid and texturing agent, which is applied in the field of silicon chip texturing agent containing kelp extract and its preparation, which can solve the problems of large chemical consumption, poor texturing repeatability, and affecting product quality, and achieve product quality Stabilize, improve stability, increase the effect of anisotropy

Inactive Publication Date: 2015-12-09
ANHUI KING AUTO ELECTRONICS TECH CO LTD
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short service life, large chemical consumption, low reaction controllability, and poor texturing repeatability, which directly affect product quality

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0013] Non-limiting examples of the present invention are as follows:

[0014] A kind of silicon chip texturizing agent containing kelp extract is prepared from the component raw materials of following weight (kg):

[0015] Kelp powder 10, sodium tripolyphosphate 5, sodium hydroxide 2.5, sodium diisooctyl succinate sulfonate 1, sorbitan monooleate 0.5, amino trimethylene phosphonic acid 0.1, texture regulator 10 , sodium benzoate 0.5, water 150;

[0016] Wherein the texturizing regulator is made of the following component raw materials by weight (kg): styrene 3, methyl methacrylate 2, polyvinyl alcohol 2, cornstarch 1, potassium persulfate 0.1, flat plus 0.5, water 80; The preparation method of the texture regulator is to add polyvinyl alcohol and corn starch to 1 / 2 amount of water and stir at 60°C for 1 hour, then add Pingpingjia and stir for 5 minutes at 1000r / min, add styrene, methyl methacrylate and potassium persulfate Mix well and heat to 85°C to react for 0.5h, and fi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
reflectanceaaaaaaaaaa
Login to View More

Abstract

The invention discloses a silicon wafer texturing agent containing a kelp extraction liquid. The silicon wafer texturing agent is characterized by being prepared from the following raw materials in parts by weight: 5-10 parts of kelp powder, 3-5 parts of sodium tripolyphosphate, 1.5-2.5 parts of sodium hydroxide, 0.5-1 part of diisooctyl sodium sulfosuccinate, 0.3-0.5 part of sorbide monooleate, 0.1-0.2 part of amino trimethylene phosphonic acid, 5-10 parts of a texturing adjustor, 0.5-1 part of sodium benzoate and 100-150 parts of water. The silicon wafer texturing agent disclosed by the invention not only can improve the texturing efficiency and the stability of a texturing process, but also can reduce the use level of chemicals, and is non-toxic and harmless, and the cost is lowered, so that the conversion efficiency of a battery piece is effectively improved, and the product quality is stable.

Description

technical field [0001] The invention relates to silicon chip texturing technology, in particular to a silicon chip texturing agent containing kelp extract and a preparation method thereof. Background technique [0002] Texturing is an important process in the production process of solar cells. Using the principle of anisotropic corrosion of single crystal silicon by low-concentration alkaline etching solution, a "pyramid" structure is formed on the surface of the silicon wafer to reduce the reflectivity of the silicon wafer surface and increase Absorb light, reduce reflectivity, and improve conversion efficiency of solar cells. At present, the conventional texturing process generally uses sodium hydroxide or potassium hydroxide, and adds a suitable mixed solution of isopropanol and sodium silicate for texturing. The isopropanol and other components used in the existing texturing liquid have large volatilization, poor environmental protection, short service life, large chemi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C30B33/10
Inventor 王进
Owner ANHUI KING AUTO ELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com