Promoter for mechanical plating of copper and copper alloy and use method of promoter
An accelerator and copper alloy technology, applied in the field of mechanical copper plating and copper alloy accelerators, can solve the problems of easy oxidation, discoloration and blackening of metal copper, and achieve fast plating speed, stable color and high production efficiency. Effect
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Embodiment 1
[0022] Mechanical copper plating and copper alloy accelerator raw material mass percentage:
[0023] Diatomaceous earth 0.5%
[0024] Sodium Gluconate 1%
[0025] Triethanolamine 0.5%
[0027] Tin protochloride 78%
[0028] Ammonium dihydrogen phosphate 8%
[0029] Boric acid 1%
[0030] Polyethylene glycol 10%
[0031] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0032] The accelerator for mechanical copper plating and copper alloy described in this embodiment is used for mechanical copper plating and copper alloy on the surface of iron and steel parts. When in use, the accelerator is configured as an aqueous solution. OP-10, add accelerator powder at last to obtain accelerator aqueous solution, the mass percent of accelerator powder in accelerator aqueous solution is 40%, the mass percent of OP-10 is 2%, the mass percent of phosphoric acid is 7%, and balance is water. The r...
Embodiment 2
[0035] Mechanical copper plating and copper alloy accelerator raw material mass percentage:
[0036] Diatomaceous earth 2%
[0037] Sodium Gluconate 1%
[0038] Triethanolamine 1%
[0040] Tin protochloride 80%
[0041] Ammonium dihydrogen phosphate 5%
[0042] Boric acid 2%
[0043] Polyethylene glycol 6%
[0044] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0045] The accelerator for mechanical copper plating and copper alloy described in this embodiment is used for mechanical copper plating and copper alloy on the surface of iron and steel parts. When in use, the accelerator is configured as an aqueous solution. OP-10, add accelerator powder at last to obtain accelerator aqueous solution, the mass percent of accelerator powder is 40% in accelerator aqueous solution, the mass percent of OP-10 is 4%, the mass percent of phosphoric acid is 5%, and balance is water. The relati...
Embodiment 3
[0048] Mechanical copper plating and copper alloy accelerator raw material mass percentage:
[0049] Diatomaceous earth 1%
[0050] Sodium Gluconate 1.5%
[0051] Triethanolamine 0.8%
[0052] Ammonium chloride 2.5%
[0053]Tin protochloride 80%
[0054] Ammonium dihydrogen phosphate 6%
[0055] Boric acid 1.5%
[0056] Polyethylene glycol 6.7%
[0057] The above raw materials are all industrial grade chemical raw materials, and the water is clean tap water.
[0058] The accelerator for mechanical copper plating and copper alloy described in this embodiment is used for mechanical copper plating and copper alloy on the surface of iron and steel parts. When in use, the accelerator is configured as an aqueous solution. OP-10, add accelerator powder at last to obtain accelerator aqueous solution, the mass percent of accelerator powder in accelerator aqueous solution is 40%, the mass percent of OP-10 is 5%, the mass percent of phosphoric acid is 6%, and balance is water. T...
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