Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method of super-hydrophobic self-cleaning glass based on ZnO nano array coating

A nano-array and nano-rod array technology is applied in the field of preparation of superhydrophobic self-cleaning glass, which can solve the problems of cluttered light environment, damage to urban landscape, loss of original characteristics, etc. Band width effect

Inactive Publication Date: 2015-06-10
TIANJIN CHENGJIAN UNIV
View PDF2 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, although ordinary glass is naturally beautiful, it is not resistant to pollution, especially with the increasing environmental pollution, there is a lot of dust in the atmosphere, and the glass curtain wall is easily covered with dust and loses its original characteristics.
The problem of light pollution has long attracted people's attention. The glass curtain wall of a building is like a huge mirror, which will have uneven color and different ripples, making the light reflection uncontrollable, resulting in a messy light environment and destroying the urban landscape.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method of super-hydrophobic self-cleaning glass based on ZnO nano array coating
  • Preparation method of super-hydrophobic self-cleaning glass based on ZnO nano array coating
  • Preparation method of super-hydrophobic self-cleaning glass based on ZnO nano array coating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] 1. Process parameters for preparing ZnO seed layer sol: use sol-gel method, use zinc acetate as precursor, monoethanolamine as complexing agent, and ethylene glycol methyl ether as solvent to prepare 0.3mol / L ZnO seed layer sol.

[0030] 2. Process parameters for preparing the ZnO seed layer: immerse the ITO glass substrate in the ZnO sol prepared above for 20s, make the sol fully contact with the surface of the ITO glass substrate, and then pull the ITO glass vertically at a speed of 6cm / min The substrate, the wet film was moved into a 100°C thermostat for 20 minutes, and the operation was repeated once. The film was placed in a muffle furnace and heat-treated at 400°C for 4 hours to obtain an ITO glass substrate with a ZnO seed layer.

[0031] 3. Process parameters for preparing ZnO / PS nanorod arrays: 0.05mol / L growth solution was prepared with zinc nitrate and hexamethylenetetramine at a ratio of 1:1. The prepared ITO glass substrate with the ZnO seed layer was put i...

Embodiment 2

[0035]1. Process parameters for preparing ZnO seed layer sol: use sol-gel method, use zinc acetate as precursor, monoethanolamine as complexing agent, and ethylene glycol methyl ether as solvent to prepare 0.1mol / L ZnO seed layer sol.

[0036] 2. Process parameters for preparing the ZnO seed layer: immerse the ITO glass substrate in the ZnO sol prepared above for 20s, make the sol fully contact with the surface of the ITO glass substrate, and then pull the ITO glass vertically at a speed of 6cm / min For the substrate, the wet film was moved into a 100°C constant temperature oven for drying treatment for 15 minutes, and the operation was repeated once, and the film was placed in a muffle furnace for heat treatment at 400°C for 3 hours to obtain an ITO glass substrate with a ZnO seed layer.

[0037] 3. Process parameters for preparing ZnO / PS nanorod arrays: 0.02mol / L growth solution was prepared with zinc nitrate and hexamethylenetetramine at a ratio of 1:1. The prepared ITO glas...

Embodiment 3

[0041] 1. Process parameters for preparing ZnO seed layer sol: use sol-gel method, use zinc acetate as precursor, monoethanolamine as complexing agent, and ethylene glycol methyl ether as solvent to prepare 0.2mol / L ZnO seed layer sol.

[0042] 2. Process parameters for preparing the ZnO seed layer: immerse the ITO glass substrate in the ZnO sol prepared above for 20s, make the sol fully contact with the surface of the ITO glass substrate, and then pull the ITO glass vertically at a speed of 6cm / min For the substrate, the wet film was moved into a 100°C constant temperature oven for drying treatment for 18 minutes, and the operation was repeated once, and the film was placed in a muffle furnace for heat treatment at 400°C for 3.5 hours to obtain an ITO glass substrate with a ZnO seed layer.

[0043] 3. Process parameters for preparing ZnO / PS nanorod arrays: 0.03mol / L growth solution was prepared with zinc nitrate and hexamethylenetetramine at a ratio of 1:1. The prepared ITO g...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a preparation method of super-hydrophobic self-cleaning glass based on a ZnO nano array coating. The preparation method comprises the following steps: preparing ZnO seed layer sol by a sol-gel method; plating ITO glass with a ZnO seed layer by a dipping-pulling method; performing heat treatment and paving a layer of polystyrene spheres; performing hydrothermal treatment on the prepared ZnO seed layer / PS material in a ZnO growth solution to obtain a ZnO / PS nano rod array; and treating the ZnO / PS nano rod array with toluene for a period of time to obtain the super-hydrophobic self-cleaning glass. According to the super-hydrophobic self-cleaning glass based on a ZnO nano array coating prepared by the method disclosed by the invention, the transmittance of visible light can reach 96.3%, and both of the ultraviolet absorption efficiency and shielding efficiency can reach 90%; and according to the test by a contact angle meter (DSA series), the contact angle to water exceeds 152 degrees. The preparation method disclosed by the invention has the advantages of no secondary harm, low cost, easiness in implementation and convenience in control.

Description

technical field [0001] The invention belongs to the field of preparation of self-cleaning functional coating materials, in particular to a preparation method of superhydrophobic self-cleaning glass based on ZnO nano-array coating. Background technique [0002] Self-cleaning functional glass means that ordinary glass has unique physical properties on its surface after being treated by special physical or chemical methods. It no longer needs to be cleaned by traditional manual scrubbing but can be cleaned under the action of natural rainwater. coated glass. With the development of modern cities, glass curtain wall, as a beautiful and novel way of building wall decoration, has become a prominent feature of the era of modern high-rise and super high-rise buildings. However, although ordinary glass is naturally beautiful, it is not resistant to pollution. Especially with the increasing environmental pollution, there is a lot of dust in the atmosphere, and the glass curtain wall ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C17/23
Inventor 刘志锋刘军启韩建华殷建赵丹
Owner TIANJIN CHENGJIAN UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com