Preparation method of thin film transistor, thin film transistor, and array substrate

Abstract

The invention belongs to the technical field of display, and relates to a preparation method of a thin film transistor, a thin film transistor and an array substrate. The preparation method of the thin film transistor: forming patterns including different surface energies on a substrate; coating a composite solution containing an organic semiconductor material and a polymer insulating material on the substrate, and forming a composite thin film; according to the patterns on the substrate with different surface energies , the composite film is patterned, and the composite film corresponding to the patterned area with relatively high surface energy is retained; the composite film is delaminated by the organic solvent vapor treatment method; two separate metals are formed on opposite sides of the patterned composite film electrode. In the preparation method of the organic thin film transistor, during the patterning process of forming the organic semiconductor layer, the film forming synchronization between the patterns is strictly guaranteed, and the gap between the active layer patterns of each organic thin film transistor on the substrate is eliminated or reduced. Therefore, the device performance of the organic thin film transistor array is guaranteed.

Description

technical field [0001] The invention belongs to the field of display technology, and in particular relates to a preparation method of a thin film transistor, a thin film transistor and an array substrate. Background technique [0002] Organic thin film transistor (Organic Thin Film Transistor, referred to as OTFT) has been widely concerned by academia and industry since its discovery. Its manufacturing cost is low, and it can meet the requirements that silicon semiconductor processes such as flexibility and large area cannot meet. However, the patterning of organic semiconductor materials in organic thin film transistors has always been a controversial topic. Because it cannot match the photolithography process, organic semiconductor materials cannot be patterned by photolithography, which makes the industrialization of organic thin film transistors a challenge. problem. [0003] In the continuous efforts of the academic community in the past 10 years, more and more organic...

AI Technical Summary

Problems solved by technology

However, the patterning of organic semiconductor materials in organic thin film transistors has always been a controversial topic. Because it cannot match the photolithography process, organic semiconductor materials cannot be patterned by photolithography, which makes the industrialization of organic thin film transistors a challenge. problem

These methods can directly form a patterned organic semiconductor thin film on the substrate for preparing the organic semiconductor, but this also leads to the problem of asynchronous film formation between patterns and patterns during the patterning process of the organic semiconductor layer, resulting in the formation of various films on the substrate. The film formation difference between patterns is large, which affects the device performance of organic thin film transistor arrays, which is an undesirable thing in industrial production

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