Inductance coil and inductance coupling plasma processing device
A plasma and processing device technology, applied in the field of ion processing equipment, can solve the problems of crystal element influence, waste of radio frequency energy, unreliable ignition of plasma, etc.
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[0023] See figure 1 , which is a schematic diagram of the structure of the inductance coil of the present invention. The inductance coil of the present invention includes a first coil 10 and is connected to a radio frequency power supply or other external circuits through a radio frequency input connection part 100 . The inductance coil of the present invention also includes an intermediate coil 20 located below the first coil, the intermediate coil is in the shape of a flat plate, and its width is larger than that of the first coil 10 . The first coil 10 forms a circular ring, one end is a connecting portion 100 , and the other end is connected to the intermediate coil 20 through a downward first intermediate connecting portion 12 . The middle coil forms a ring, one end is the first connecting part 12 , and the other end is the second middle connecting part 32 . The second intermediate connecting portion extends upward from the surface of the intermediate coil 20 and is con...
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