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A method for preparing solar single crystal back-polished cells

A technology of back polishing and solar energy, applied in photovoltaic power generation, circuits, electrical components, etc., can solve problems such as high cost, environmental pollution, and increased production costs, and achieve the goals of reducing production costs, improving uniformity of square resistance, and increasing the lifetime of minority carriers Effect

Active Publication Date: 2017-02-01
HENGDIAN GRP DMEGC MAGNETICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method needs to add additional equipment or modify the existing wet etching tank, the cost of improving the matching of the original production line is high, and the polishing solution uses an organic solution or an alkaline solution with a surfactant, which causes environmental pollution, and increased production costs

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] (a) After texturizing and diffusing 50 pieces of 156-type monocrystalline silicon wafers, use HF and HNO in the wet etching bath 3 Solution etching to remove the PSG and PN junctions on the back;

[0028] (b) Immerse in a 160g / L sodium hydroxide solution with 7mL / L absolute ethanol at a temperature of 65°C, and ultrasonically polish for 120s by bubbling;

[0029] (c) pickling, washing and drying the single crystal silicon wafer after back polishing with HF;

[0030] (d) Using PECVD to deposit silicon nitride on the front side of the single crystal silicon wafer, and perform electrode printing and sintering to complete the production of the entire battery.

[0031] Among them, the reflectance of the back surface of the silicon wafer after back polishing is tested, the reflectance of the front surface of the silicon wafer after pickling and water washing is tested, and the electrical performance of the finished battery is tested.

Embodiment 2

[0033] (a) After texturizing and diffusing 50 pieces of 156-type monocrystalline silicon wafers, use HF and HNO in the wet etching bath 3 Solution etching to remove the PSG and PN junctions on the back;

[0034] (b) Immerse in a 120g / L sodium hydroxide solution with 7mL / L absolute ethanol at a temperature of 75°C, and ultrasonically polish for 180s by bubbling;

[0035] (c) pickling, washing and drying the single crystal silicon wafer after back polishing with HF;

[0036] (d) Using PECVD to deposit silicon nitride on the front side of the single crystal silicon wafer, and perform electrode printing and sintering to complete the production of the entire battery.

[0037] Among them, the reflectance of the back surface of the silicon wafer after back polishing is tested, the reflectance of the front surface of the silicon wafer after pickling and water washing is tested, and the electrical performance of the finished battery is tested.

Embodiment 3

[0039] (a) After texturizing and diffusing 50 pieces of 156-type monocrystalline silicon wafers, use HF and HNO in the wet etching bath 3 Solution etching to remove the PSG and PN junctions on the back;

[0040] (b) Immerse in a 100g / L sodium hydroxide solution with 7mL / L absolute ethanol at a temperature of 60°C, and bubble and ultrasonically polish for 600s;

[0041] (c) pickling, washing and drying the single crystal silicon wafer after back polishing with HF;

[0042] (d) Using PECVD to deposit silicon nitride on the front side of the single crystal silicon wafer, and perform electrode printing and sintering to complete the production of the entire battery.

[0043] Among them, the reflectance of the back surface of the silicon wafer after back polishing is tested, the reflectance of the front surface of the silicon wafer after pickling and water washing is tested, and the electrical performance of the finished battery is tested.

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Abstract

The invention discloses a method for preparing a solar monocrystal back polished cell piece. Through improving a diffusion technology, the method comprises: generating PSG in certain thickness and density on the surface of a monocrystalline silicon piece; in a wet etching groove, removing PSG and PN junctions on the back surface of the monocrystalline silicon piece by using HF and HNO3 solutions; in an ultrasonic cleaning bubbling groove, performing back polishing by using a sodium hydroxide solution which is in certain temperature and is added with water; then, performing HF acid pickling, washing, and drying on the back polished monocrystalline silicon piece; finally, using PECVD to deposit silicon nitride on the front surface of the monocrystalline silicon piece, and performing electrode printing and sintering. Beneficial effects of the method are that through improving the diffusion technology, thickness and consistency of a diffusion silicon piece PSG are increased, silicon piece sheet resistance uniformity is improved, a dead layer of the silicon piece is removed, and service life of the silicon piece is improved, the method does not need additional devices or reform an existing wet etching groove, and is simple and easy, a polishing solution is an aqueous alkali which does not contain an organic solution or added with a surface active agent, so the solution would not cause environmental pollution, and production cost is reduced.

Description

technical field [0001] The invention relates to the related technical field of solar single crystal cells, in particular to a method for preparing solar single crystal back polished cells. Background technique [0002] The back polishing technology of monocrystalline silicon wafers can improve the optical efficiency of solar silicon wafers, enhance the passivation effect of the back surface of silicon wafers, and improve the photoelectric conversion efficiency of solar cells, and can be superimposed with mainstream technologies such as SE, LBSF, PERL, and MWT, and is compatible Good performance, can further improve the performance of solar cells using these technologies, and promote the development of high-efficiency solar cell industrialization. The back surface polishing technology of monocrystalline silicon cells needs to be combined with the development needs of solar cell industrialization to make it more environmentally friendly, use less polishing chemicals, and make ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18H01L31/0216
CPCH01L21/0209H01L31/02363Y02E10/50Y02P70/50
Inventor 赵锋陈健生徐君
Owner HENGDIAN GRP DMEGC MAGNETICS CO LTD
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