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Low-pressure discharge plasma water treating apparatus and method

A discharge plasma and water treatment device technology, applied in electrochemical water/sewage treatment, illuminated water/sewage treatment, oxidized water/sewage treatment, etc. Low efficiency and other problems, to achieve the effect of ensuring purification efficiency and processing energy efficiency, reducing system energy consumption and high energy consumption

Active Publication Date: 2014-09-24
江苏先竞等离子体技术研究院有限公司
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  • Application Information

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Problems solved by technology

It overcomes the problems of low high-frequency high-voltage power supply efficiency, low gas discharge power utilization rate, small plasma volume, and poor diffusivity that are common in the atmospheric pressure discharge excited plasma water treatment device and method; Under the condition of uninterrupted water circulation, it is difficult to maintain the low-pressure discharge environment in the reactor without forced discharge pumps

Method used

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  • Low-pressure discharge plasma water treating apparatus and method

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specific Embodiment approach 2

[0046] according to figure 2 Shown structure, in 5 embodiments 1 (as figure 1 As shown), the single reactor devices are assembled side by side to form a system, in which the radio frequency power supply, vacuum group (including vacuum pump, gas valve, gas ballast valve and exhaust pipe), water flow monitor, sewage tank and water purification tank are five The reactors are shared, therefore, the rated power of the RF power supply is 5000W, the vacuum pump is 2X-15 with a pumping speed of 15 liters per second, and the water flow monitor is adjustable from 5 liters / minute to 100 liters / minute. The water treatment process is the same as in Embodiment 1, and the results are also consistent.

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Abstract

The invention relates to a low-pressure discharge plasma water treating apparatus, mainly comprising a discharge power supply, a high voltage electrode, a reactor, an atomization sprinkler, a water inlet pipe, a water outlet pipe, a water flow monitor, an air exhaust pipe, an air valve, a vacuum pump, a sewage pool and a clean water reservoir. According to the invention, without a water pump, a low pressure environment in the reactor can be maintained via only one vacuum pump under the condition that water flows through the reactor; electro-discharge is carried out in the low pressure environment, and large-volume, high-activity and non-thermal equilibrium plasma is generated; the treating apparatus can effectively remove pollution sources like heavy metal ions, organic matters and microbes in water, has high treatment efficiency, is generally applicable to sewages having different pollution degrees and produced by different industries and provides activated water for special industries. The invention further relates to a plasma water treating method which realizes low pressure discharge under the condition that a water cycle between the interior of the reaction chamber and the outside is maintained without usage of a forced exhaust type water pump. With the method, system energy consumption is greatly reduced.

Description

Technical field [0001] The invention relates to the technical field of application of low-temperature plasma, in particular to a low-pressure discharge plasma device and method that can be used for water treatment. technical background [0002] Commonly used water treatment methods are: sediment filtration, hard water softening, activated carbon adsorption, deionization, reverse osmosis, ultrafiltration, distillation, ultraviolet disinfection, and biochemical methods. The following are the technical characteristics of these commonly used water treatment methods: [0003] Sediment filtration method: This is the oldest and simplest water purification method, so this step is often used in the preliminary treatment of water purification, or when necessary, several more filters will be added to the pipeline to remove larger volumes Impurities. There are many types of filters used to filter suspended particulate matter, such as mesh filters, sand filters (such as quartz sand, et...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F1/32C02F1/72C02F1/78C02F1/46
Inventor 孙红梅区琼荣
Owner 江苏先竞等离子体技术研究院有限公司
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