Negative-type photosensitive resin composition, partition wall, black matrix, and optical element

A technology of photosensitive resin and composition, which is applied in the field of optical elements, can solve the problems of high dielectric constant, inability to increase the dosage, difficulty in balancing light-shielding and electrical properties, etc., and achieve good dispersion and good storage stability.

Active Publication Date: 2014-07-23
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the past, carbon black was used as a black coloring agent for partition walls. However, due to the low resistance and high dielectric constant of carbon black, the amount cannot be increased, and it is difficult to achieve sufficient light-shielding and electrical properties.

Method used

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  • Negative-type photosensitive resin composition, partition wall, black matrix, and optical element
  • Negative-type photosensitive resin composition, partition wall, black matrix, and optical element
  • Negative-type photosensitive resin composition, partition wall, black matrix, and optical element

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0550] The following examples are used to further describe the present invention in detail, but the present invention is not limitedly interpreted by these examples.

[0551] It should be noted that Examples 1 to 13 and Examples 17 to 19 are examples, and Examples 14 to 16 are comparative examples.

[0552] Each measurement was performed according to the following method.

[0553] (Number average molecular weight (Mn) and mass average molecular weight (Mw))

[0554] The measurement was performed by gel permeation chromatography (manufactured by Tosoh Corporation, device name: HLC-8220GPC) using polystyrene as a standard substance.

[0555] Measurement conditions;

[0556] (The content of fluorine atoms in the ink repellent (E), the amount of olefinic double bonds, and the acid value)

[0557] The content of fluorine atoms in the ink repellent (E) is based on 1,4-bis(trifluoromethyl)benzene as the standard material, and the 19 It was calculated by F-NMR measurement (manufactured by JEOL Lt...

Synthetic example 1

[0604] [Synthesis example 1: Synthesis of ink repellent agent (E1-1)]

[0605] The ink repellent agent (E1-1) classified as the ink repellent agent (E1) was synthesized by the following method.

[0606] Put MEK (700g), C6FMA (140g), MAA (15g), PME400 (60g), 2-HEMA (85g) and polymerization initiator V-65 into an autoclave equipped with a stirrer and an internal volume of 2L (liter). (2g), polymerize at 50°C for 24 hours while stirring in nitrogen to synthesize a crude copolymer. Hexane was added to the solution of the obtained crude copolymer for reprecipitation purification, and then vacuum dried to obtain copolymer 1 (242 g).

[0607] The number average molecular weight (Mn) of this copolymer 1 was 35,000, and the mass average molecular weight (Mw) was 91,000.

[0608] (Introduction of olefinic double bonds)

[0609] Put copolymer 1 (40g), AOI (12g), DBTDL (0.05g), BHT (0.2g) and MEK (130g) into a glass flask equipped with a thermometer, a stirrer, and a heating device and an inner v...

Synthetic example 2

[0612] [Synthesis Example 2: Synthesis of Ink Repellent (E1-2)]

[0613] The ink repellent agent (E1-2) classified as the ink repellent agent (E1) was synthesized by the following method.

[0614] In the synthesis of the copolymer 1, except for changing the formulation of the raw materials as shown in Table 1, the copolymer 2 was obtained by the same copolymerization reaction. Next, in the synthesis of the ink repellent agent (E1-1), except for changing the formulation of the raw materials as shown in Table 1, the ink repellent agent (E1-2) was obtained by the same reaction. The mass average molecular weight (Mw), number average molecular weight (Mn), fluorine atom content, amount of olefinic double bond (C=C amount, ×10) of the obtained ink repellent agent (E1-2) -3 mol / g) and acid value (mgKOH / g) are shown in Table 1.

[0615] The ink repellent agent solution (E1-21) obtained by mixing the ink repellent agent (E1-2) and PGMEA at a mass ratio of 1:9 was prepared and used in the fol...

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Abstract

Provided are: a negative-type photosensitive resin composition containing a black organic pigment, having good properties of dispersion of a contained organic pigment into an alkaline developer and good storage stability, and wherein formation of a partition wall having both a fine pattern and microscopic contact holes is possible in the negative-type photosensitive resin composition; the partition wall obtained by curing the negative-type photosensitive resin composition; a black matrix; and an optical element having the black matrix. The negative-type photosensitive resin composition contains: an alkali-soluble resin including an aromatic ring in the main chain thereof, and having an acidic group and an ethylenic double bond in the molecules thereof; an alkali-soluble resin not including an aromatic ring in the main chain thereof, and having an acidic group in the molecules thereof; the black organic pigment; and a photopolymerization initiator. The negative-type photosensitive resin composition is characterized by having a solid acid number of 10-50 mg KOH/g.

Description

Technical field [0001] The present invention relates to a negative photosensitive resin composition, a partition wall and a black matrix using the same, and an optical element having the black matrix. Background technique [0002] In a liquid crystal display as a liquid crystal display device, a technology of forming a color filter as an optical element on a TFT (Thin Film Transistor) array substrate side of a color filter on array has been proposed (for example, refer to Patent Document 1). [0003] In the color filter of the color filter array type, the black matrix separating the pixels is formed on the array substrate. Therefore, this type of color filter is also called the black matrix on array (black matrix on array, hereinafter also Called "BOA type".) color filter. Compared with ordinary color filters that require precision in the separate manufacture and calibration of color filters and TFT array substrates, BOA type color filters can ensure precision without calibration...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G02B5/20G03F7/004G03F7/031G03F7/033G03F7/075G03F7/20H01L21/027
CPCG03F7/0007G03F7/0046G03F7/027G03F7/031G03F7/032G03F7/038G03F7/0388G03F7/0757G03F7/105
Inventor 小尾正树山田光太郎
Owner ASAHI GLASS CO LTD
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