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Preparation method of electrochemical sensor

A sensor and electrochemical technology, applied in the field of micromachining, can solve the problems of low pollution and low-cost mass production of electrochemical sensors that are difficult to achieve

Active Publication Date: 2014-05-21
HANGZHOU TINKER BIOTECHNOLOGY CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In the preparation process of photolithography combined with wet etching, although high-precision electrochemical sensors can be obtained, the preparation process requires expensive photolithography equipment and ultra-clean environments, and requires a large amount of etching solution, so It is difficult to achieve low pollution, low cost and mass production of electrochemical sensors

Method used

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  • Preparation method of electrochemical sensor

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] figure 1 It is a schematic diagram of the preparation process of a two-electrode electrochemical sensor. The specific preparation process of a dual-electrode Au electrode is as follows: (1) Firstly, the fluid inlet and outlet C, the microcavity structure D and the double The electrode protection structure E with completely consistent electrode patterns, and then the microfluidic chip and the surface of the glass substrate B with the Au film F on the surface to be processed are reversibly bonded using a fixture; (2) use an external pump system to pump aqua regia (HF: HNO 3 :H 2 (2=1:1:5, volume ratio) the solution G is continuously introduced into the microfluidic chip along a polytetrafluoroethylene hose, and the etching waste liquid H flows out from another outlet; (3) finally, the polytetrafluoroethylene The microfluidic chip was peeled off from the surface of the glass substrate to obtain an Au double-electrode electrochemical sensor.

Embodiment 2

[0019] Embodiment 2 Preparation of a three-electrode type Ag electrode

[0020] figure 2 It is a schematic diagram of the preparation process of a three-electrode electrochemical sensor. A specific preparation process of a three-electrode Ag electrode in this embodiment is as follows: first, a polydimethylsiloxane (PDMS) chip is prepared by pouring and polymerizing a photoresist mold, and the chip has a fluid inlet and outlet, a microcavity structure and The electrode protection structure of the three electrode patterns is completely consistent, and then the microfluidic chip and the surface of the polymethyl methacrylate (PMMA) substrate d with Ag film on the surface to be processed are reversibly bonded or chip a is obtained; then use The external pump system continuously introduces the ferric chloride solution b into the microfluidic chip a along a polytetrafluoroethylene hose, and the etching waste liquid c flows out from another outlet; finally, the PDMS microfluidic ch...

Embodiment 3

[0021] Embodiment 3 Preparation of a kind of ITO electrochemical sensor

[0022] A specific preparation process of two-electrode type and three-electrode type ITO electrochemistry can be found in figure 1 and figure 2 The details are as follows: firstly, the PDMS microfluidic chip is prepared by pouring and polymerizing the photoresist mold. The surface of the glass substrate with ITO film on the surface to be processed is reversibly bonded; then the HCl solution is continuously introduced into the microfluidic chip along a polytetrafluoroethylene hose by using an external pump system, and the HCl etching solution is used for ITO. For regionalized etching, the etching waste liquid flows out from another outlet of the microfluidic chip; finally, the PDMS microfluidic chip is peeled off from the surface of the glass substrate to obtain an ITO electrochemical sensor.

[0023] Using the preparation method of the electrochemical sensor provided by the present invention, the etch...

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Abstract

The invention provides a preparation method of an electrochemical sensor. The preparation method is characterized by covering the surface of a solid conductive film with a micro-fluidic chip, and continuously guiding etching fluid into the micro-fluidic chip so as to realize the rapid patterned etching of the conductive film. Since the etching liquid on the surface of the conductive film is continuously updated, the etching efficiency is remarkably improved; in addition, the volume of an etching cavity inside the micro-fluidic chip is small, so that the consumption of etching liquid is greatly reduced. The preparation method can be used for mass production of electrochemical sensors.

Description

technical field [0001] The invention relates to the field of micromachining, in particular to a preparation method of an electrochemical sensor. Background technique [0002] Electrochemical sensor is an important analysis and detection technology platform, which is widely used in the field of chemical or biological analysis. At present, electrochemical sensors are mainly prepared based on the wet etching method of patterning conductive thin films, specifically including screen printing and wet etching processes. Due to the advantages of fast processing speed and low cost, screen printing technology has been widely used in the mass production of microelectrodes, such as the preparation of electrochemical blood glucose test strips. However, the screen printing technology has limitations such as limited processing accuracy and slightly rough edges of the prepared microelectrodes, so it is not suitable for the preparation of microelectrode electrochemical sensors that require ...

Claims

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Application Information

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IPC IPC(8): G01N27/26G01N27/333
Inventor 叶嘉明苑宝龙黄昱俊
Owner HANGZHOU TINKER BIOTECHNOLOGY CO LTD
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