Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Tin-plated copper-alloy material for terminal and method for producing the same

A manufacturing method and technology of copper alloys, which are applied in the plating of superimposed layers, chemical instruments and methods, and metal material coating processes, etc., can solve problems such as the reduction of the kinetic friction coefficient, the reduction of solder wettability, and the increase of contact resistance. , to achieve the effect of reducing the coefficient of kinetic friction, low contact resistance, and stable contact resistance

Active Publication Date: 2014-01-22
MITSUBISHI MATERIALS CORP
View PDF8 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the CuSn alloy layer is exposed on the surface layer, Cu oxides are formed on the surface layer, resulting in an increase in contact resistance and a decrease in solder wettability.
In addition, there is a problem that even if the average roughness of the CuSn alloy layer is controlled, the dynamic friction coefficient cannot be reduced to 0.3 or less.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Tin-plated copper-alloy material for terminal and method for producing the same
  • Tin-plated copper-alloy material for terminal and method for producing the same
  • Tin-plated copper-alloy material for terminal and method for producing the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0069] A Corson-based (Cu-Ni-Si-based) copper alloy with a plate thickness of 0.25 mm is used as the base material, and nickel plating, copper plating, and tin plating are sequentially performed. In this case, the plating conditions of nickel plating, copper plating, and tin plating are the same in Examples and Comparative Examples, and are shown in Table 1. In Table 1, Dk is the current density of the cathode, ASD is A / dm 2 The omitted representation of .

[0070] [Table 1]

[0071]

[0072] After the coating treatment with the thickness shown in Table 2, in the examples and comparative examples, as a reflow treatment, in a reducing atmosphere, the temperature was raised until the surface temperature of the substrate became 240-360 °C, and then the above-mentioned coating was heated according to the thickness of the coating. (1) After the time within the range indicated in (2), cool with water.

[0073] Table 2 shows the holding time of (1) and (2).

[0074] [Table 2] ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides a tin-plated copper-alloy material for terminal and a method for producing the same with an excellent insertion / extraction performance and has an object of reducing dynamic friction coefficient to 0.3 or less with an excellent electrical-connection characteristic. A Cusn alloy layer / a NiSn alloy layer / a Ni or Ni alloy layer are formed between a Sn-based surface layer and a substrate made of Cu or Cu alloy; the Cusn alloy layer is a compound-alloy layer containing Cu 6 Sn 5 as a major proportion and a part of Cu in the Cu 6 Sn 5 is displaced by Ni; the Nisn alloy layer is a compound-alloy layer containing Ni 3 Sn 4 as a major proportion and a part of Ni in the Ni 3 Sn 4 is displaced by Cu; an average interval S of point peaks of the Cusn alloy layer is not less than 0.8 [mu]m and not more than 2.0 [mu]m; an average thickness of the Sn-based surface layer is not less than 0.2 [mu]m and not more than 0.6 [mu]m; an exposed-area rate of the CuSn alloy layer exposed at a surface of the Sn-based surface layer is not less than 1% and not more than 40%; an average of equivalent-circle diameter of the exposed portions of the Cusn alloy layer exposed at the surface of the Sn-based surface layer is not less than 0.1 [mu]m and not more than 1.5 [mu]m; and dynamic friction coefficient is not more than 0.3.

Description

technical field [0001] The present invention relates to a tin-plated copper alloy terminal material useful as a terminal for a connector, especially a terminal for a multi-pin connector, used for connecting electrical wiring of automobiles or consumer equipment, and a method for producing the same. [0002] This application claims priority based on Japanese Patent Application No. 2012-148575 for which it applied in Japan on July 2, 2012, and uses the content here. Background technique [0003] Tin-plated copper alloy terminal material is a terminal material in which a CuSn alloy layer is formed on the lower layer of the Sn-based surface layer on the surface layer after performing copper plating and tin plating on the base material made of copper alloy, and is widely used. For terminal material. [0004] In recent years, for example, as electrification of automobiles has been rapidly advanced, the number of circuits of electrical equipment has increased, and therefore the si...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01R13/03C23C30/00C25D5/12C25D5/50C25D7/00
CPCB32B15/01C25D5/12C22C9/06H01R13/03C23C28/02C23C28/021C23C28/023C25D3/12C25D3/30C25D3/38C25D5/505C25D7/00Y10T428/12201C25D5/627C25D5/50C22C9/00H01B1/026
Inventor 谷之内勇树加藤直树久保田贤治
Owner MITSUBISHI MATERIALS CORP
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products