Picosecond laser etching microcircuit process
A picosecond laser and micro-circuit technology, applied in printed circuit, laser welding equipment, printed circuit manufacturing, etc., can solve the problems of low yield, many manufacturing processes, and long production cycle, and achieve high yield, high productivity, Effects in simple steps
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Embodiment 1
[0032] A picosecond laser etching microcircuit process, comprising the steps of:
[0033] A. Fix the PET film with the ceramic film substrate and the metal conductive film layer on the surface facing up on the working platform of the laser etching machine, and adjust the relative position of the laser etching machine and the working platform or the laser of the laser etching machine. The height of the head is such that the laser focus of the laser etching machine falls directly above the substrate; in the step A, the ceramic film substrate is an LTCC ceramic film substrate; the metal conductive film layer is a copper thin film.
[0034] B. The conductive film graphics and the ceramic membrane graphics to be etched are respectively exported and input into the laser etching machine, and used as two layers; laser parameters and motion parameters are respectively set for the conductive film graphics layer and the ceramic membrane graphics layer;
[0035] C, start the laser engravi...
Embodiment 2
[0042] A picosecond laser etching microcircuit process, comprising the steps of:
[0043] A. Fix the PET film with the ceramic film substrate and the metal conductive film layer on the surface facing up on the working platform of the laser etching machine, and adjust the relative position of the laser etching machine and the working platform or the laser of the laser etching machine. The height of the head makes the laser focus of the laser engraving machine fall directly above the substrate; in the step A, the ceramic film substrate is an LTCC ceramic film substrate; the metal conductive film layer is an aluminum thin film.
[0044] B. The conductive film graphics and the ceramic membrane graphics to be etched are respectively exported and input into the laser etching machine, and used as two layers; laser parameters and motion parameters are respectively set for the conductive film graphics layer and the ceramic membrane graphics layer;
[0045] C, start the laser engraving ...
Embodiment 3
[0052] A picosecond laser etching microcircuit process, comprising the steps of:
[0053] A. Fix the PET film with the ceramic film substrate and the metal conductive film layer on the surface facing up on the working platform of the laser etching machine, and adjust the relative position of the laser etching machine and the working platform or the laser of the laser etching machine. The height of the head makes the laser focus of the laser engraving machine fall directly above the substrate; in the step A, the ceramic film substrate is an LTCC ceramic film substrate; the metal conductive film layer is a nickel thin film.
[0054] B. The conductive film graphics and the ceramic membrane graphics to be etched are respectively exported and input into the laser etching machine, and used as two layers; laser parameters and motion parameters are respectively set for the conductive film graphics layer and the ceramic membrane graphics layer;
[0055] C, start the laser engraving mac...
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