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A silicon-based niobium nitride thin film superconducting material and its manufacturing method

A production method and technology of superconducting materials, applied in the manufacture/processing of superconductor devices, superconductor parts, metal material coating technology, etc., can solve the gap in superconducting performance, reduce the superconducting performance of NbN thin films, and crystal structure Problems such as large lattice mismatch

Inactive Publication Date: 2016-04-20
SUZHOU UNIV
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Problems solved by technology

However, these materials have two major disadvantages: one is that the crystal structure and lattice mismatch are still relatively large; the other is that the constituent elements of these materials will reduce the superconducting properties of NbN films if they diffuse into the NbN film
Therefore, there is still a gap between the existing Si-based NbN ultra-thin films and the superconducting properties of MgO-based NbN ultra-thin films. Exploring better transition layer materials to prepare Si-based NbN films can improve their superconducting properties. The material design and application range of superconducting thin films are very meaningful

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  • A silicon-based niobium nitride thin film superconducting material and its manufacturing method
  • A silicon-based niobium nitride thin film superconducting material and its manufacturing method
  • A silicon-based niobium nitride thin film superconducting material and its manufacturing method

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Embodiment Construction

[0028] As mentioned in the background technology, the existing Si-based NbN thin-film superconducting materials still lack suitable transition layer materials, and it is impossible to obtain thin-film superconducting materials with good lattice matching between Si crystal and NbN layer and excellent superconducting properties. To a certain extent, the application field of Si-based NbN thin film superconducting materials is limited.

[0029] Therefore, the present invention proposes a new Si-based NbN thin film superconducting material. The Si-based NbN thin film superconducting material uses TiN as a transition layer. Since TiN and NbN both belong to the face-centered cubic structure, and the lattice mismatch is small, Therefore, the use of the TiN transition layer greatly reduces the thickness of the interfacial distortion layer in the NbN film, while the crystallinity of NbN is improved; and NbTiN itself is a T c For higher superconducting materials, even if the two elements...

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Abstract

The invention prepares a silicon-based niobium nitride thin film superconducting material, which includes a Si base, a TiN transition layer, and an NbN layer. Due to the large lattice mismatch in growing NbN films directly on Si substrates, a certain thickness of non-superconducting interface distortion layer will exist in the NbN films, seriously reducing the superconducting properties of NbN. TiN and NbN both have a face-centered cubic structure, and the lattice mismatch is small. Therefore, using the TiN transition layer greatly reduces the thickness of the interface distortion layer in the NbN film, and at the same time, the crystallinity of NbN is improved, thereby improving its superconductivity. performance; and NbTiN itself is a superconducting material with a high Tc. Even if the two elements Ti and N in TiN enter the NbN film, it will not decrease, but will improve its superconducting performance. At the same time, the invention also proposes a method for producing the silicon-based niobium nitride thin film superconducting material.

Description

technical field [0001] The invention relates to the field of superconducting material production, in particular to a silicon-based niobium nitride thin film superconducting material and a production method thereof. Background technique [0002] NbN (niobium nitride) thin film is the core material of various superconducting devices, such as superconducting tunnel junction (Superconducting tunnel junction), hot electron bolometer (HEB, Hot Electron Bolometer), superconducting single photon detection device (SSPD, SuperconductingSinglePhotonDetector), etc. . Usually, NbN thin films are prepared on MgO single crystal substrates by vacuum magnetron sputtering technology. The main consideration is that the lattice mismatch between NbN and MgO is small (~4%), and the grown NbN thin films have good superconducting properties. . However, the price of MgO single crystal substrate is high, the micro-nano processing technology of subsequent devices is immature, and the loss of devices...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L39/12H01L39/24C23C14/06C23C14/35H10N60/85H10N60/01
Inventor 苏晓东张婧娇郑磊
Owner SUZHOU UNIV
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