Ultra-large size flat panel display maskless photolithography system and method

Abstract

A maskless exposure system that has multiple maskless optical engines arranged in an (NM) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.

Description

technical field [0001] The invention relates to a maskless direct writing digital photolithography technology, in particular to a maskless exposure system, a maskless exposure method, a component manufacturing method and an image scanning method. Background technique [0002] Flat panel display (FPD) substrates have been widely used in personal computers, televisions, etc. This liquid crystal display (LCD) substrate is fabricated by photolithographically preparing transparent thin-film electrodes on a photosensitive substrate. In order to achieve photolithography exposure, exposure instruments that project a template pattern onto a photoresist on a glass substrate through an optical projection system have been produced and used. [0003] Recently, it is expected that the area of ​​the flat panel display substrate will further increase. Correspondingly, the exposure area in the projection exposure device needs to be further increased. [0004] For large TFT-LCDs, it is usu...

AI Technical Summary

Problems solved by technology

Basically these very heavy quartz masks cost over $1 million

[0009] And in traditional mask lithography, patterned masks or films for high-resolution applications are usually very expensive and have a short lifetime

In addition, optical mask plates require a long procurement lead time, which is a problem for products that need to be developed in a short period of time

If a particular reticle design is found to require a pattern design modification, even a change no matter how small, the associated stencil modification costs and lead times can cause some serious problems in producing the desired product

[0010] Therefore, the current photolithography technology still has problems such as low productivity, poor exposure quality and high cost for realizing large-area exposure.

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