Electroluminescent anode, electroluminescent device and preparation method thereof
An electroluminescent device and luminescent technology, which is applied in the direction of electric solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of low hole injection efficiency and low transmittance of electroluminescent anodes, and achieve transparent The effect of improving the light effect, improving the light extraction efficiency, and simplifying the preparation process
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[0040] The embodiment of the present invention also provides the above electroluminescent device preparation method, comprising the following steps:
[0041] Form the cathode on the substrate by sputtering, evaporation or spin coating;
[0042] Forming a light-emitting layer on the cathode by sputtering, evaporation or spin coating;
[0043] forming a first dielectric layer by sputtering, evaporating or spin-coating a hole-injecting metal oxide on the light-emitting layer;
[0044] forming a metal layer on the first dielectric layer by sputtering, evaporation or spin coating;
[0045] The hole-injecting metal oxide is sputtered, evaporated or spin-coated on the metal layer to form a second dielectric layer to obtain an electroluminescence device.
[0046] Further, the preparation method of the embodiment of the present invention also includes a cleaning step of the substrate before preparing the cathode, specifically: sequentially using detergent, deionized water, acetone, e...
Embodiment 1
[0052] The ITO glass is photolithographically processed, cut into the required light-emitting area, and then ultrasonically cleaned with detergent, deionized water, acetone, ethanol, and isopropanol for 15 minutes each to remove organic pollutants on the glass surface;
[0053] Evaporate and form silver cathode on the cleaned ITO glass;
[0054] Evaporate on the silver cathode to form Bphen:CsN 3 Electron injection layer;
[0055] Evaporating and forming a Bphen electron transport layer on the electron injection layer;
[0056] Evaporating and forming a TPBi hole blocking layer on the electron transport layer;
[0057] Evaporate and form Alq on the hole blocking layer 3 luminous layer;
[0058] Evaporating and forming a TAPC electron blocking layer on the light-emitting layer;
[0059] Evaporating and forming a NPB hole transport layer on the electron blocking layer;
[0060] Evaporate and form MoO on the hole transport layer 3 The first dielectric layer has a thickness...
Embodiment 2
[0064] The manufacturing method of the electroluminescent device in the embodiment of the present invention follows the first embodiment, wherein the thickness of the first dielectric layer is 20 nanometers.
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