Composite film and film plating method thereof
A composite thin film and film layer technology, which is applied in the direction of sputtering plating, ion implantation plating, vacuum evaporation plating, etc., can solve the problems of easy wear, easy to become very fine powder, wear of gold plating layer, etc., to achieve enhanced durability Abrasion resistance, good mechanical strength, good adhesion
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[0023] The present invention also discloses a method for coating the composite thin film. The preparation method is based on the following conditions: a vacuum magnetron sputtering coating machine, and the coating machine is equipped with a plasma bias power system, a sputtering power system, a target material and an interface. The gas supply system of sputtering gas and reactive gas entering the vacuum chamber, the sputtering gas is argon, the reactive gas is nitrogen, the metal substrate is placed in the vacuum chamber, and the vacuum degree of the vacuum chamber is greater than 1.0×10 -3 Pa (vacuum degree=atmospheric pressure-absolute pressure, the greater the vacuum degree, the smaller the absolute pressure), the temperature is 140-160°C; the steps are as follows:
[0024] Step 1. Perform plasma treatment on the metal substrate to enhance the surface activity of the metal substrate. The voltage of the plasma bias power supply is 1000V-1300V, the duty cycle of the pulse squa...
Embodiment 1
[0036] When preparing a surface corrosion-resistant low-resistance film, the preparation method is based on the following conditions, a vacuum magnetron sputtering coating machine, and the coating machine is equipped with a plasma bias power system, a sputtering power system, a target and a vacuum chamber connected The gas supply system of sputtering gas and reaction gas, the sputtering gas is argon, the reaction gas is acetylene, the metal substrate is placed in a vacuum chamber, and the vacuum degree of the vacuum chamber is greater than 1.0×10 -3 Pa, the temperature is 140°C.
[0037] Plasma treatment is performed on the metal substrate to enhance the surface activity of the metal substrate. The vacuum degree is adjusted to 1.5-2.5 Pa through the flow of argon gas, the bias voltage of the plasma bias power supply is 1000V, the duty cycle of the pulse square wave is 50%, and the plasma treatment time is 30 minutes at a frequency of 40 Hz. The first metal chromium layer is p...
Embodiment 2
[0039] When preparing a surface corrosion-resistant low-resistance film, the preparation method is based on the following conditions, a vacuum magnetron sputtering coating machine, and the coating machine is equipped with a plasma bias power system, a sputtering power system, a target and a vacuum chamber connected The gas supply system of sputtering gas and reaction gas, the sputtering gas is argon, the reaction gas is acetylene, the metal substrate is placed in a vacuum chamber, and the vacuum degree of the vacuum chamber is greater than 1.0×10 -3 Pa, the temperature is 150°C.
[0040] Plasma treatment is performed on the metal substrate to enhance the surface activity of the metal substrate. The vacuum degree is adjusted to 1.5-2.5 Pa by the flow of argon gas, the bias voltage of the plasma bias power supply is 1200V, the duty cycle of the pulse square wave is 60%, and the plasma treatment time is 25 minutes at a frequency of 40 Hz. The first metal chromium layer is plated...
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