Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Preparation method and application method of high-sensitivity and high-stability surface-enhanced Raman chip

A surface-enhanced Raman and high-stability technology, applied in Raman scattering, material excitation analysis, etc., can solve the problems of repeatability and poor stability, and achieve the effect of improving detection sensitivity, high repeatability and high stability

Inactive Publication Date: 2012-08-08
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
View PDF1 Cites 22 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The "hot spots" generated by the above methods are relatively random and very small relative to the entire substrate, resulting in poor detection efficiency, repeatability and stability of surface-enhanced Raman spectroscopy.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation method and application method of high-sensitivity and high-stability surface-enhanced Raman chip
  • Preparation method and application method of high-sensitivity and high-stability surface-enhanced Raman chip
  • Preparation method and application method of high-sensitivity and high-stability surface-enhanced Raman chip

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] Example 1, using the present invention to realize the preparation and characterization of a surface-enhanced Raman chip with a structural period of 430nm and a particle diameter of 160nm with a localized surface plasmon resonance wavelength of 780nm.

[0029] (1) Choose quartz glass with a size of 1 cm × 1 cm double-sided fine polishing as the chip substrate, and after the substrate is cleaned and hydrophilized, take a monodisperse polystyrene nanosphere aqueous solution with a diameter of 430 nm and a concentration of 10%. Microliter drops onto the glass substrate for self-assembly, and after drying at room temperature, a single-layer array of polystyrene nanospheres is obtained;

[0030] (2) Etch the self-assembled polystyrene nanospheres with a reactive ion etching machine using oxygen, the power is 8W, the oxygen flow rate is 20SCCM, and the etching time is 165s;

[0031] (3) Put the etched polystyrene nanospheres into the working chamber of the vacuum coating syste...

Embodiment 2

[0034] Example 2, using the present invention to realize the application of a surface-enhanced Raman chip with a structural period of 430nm, a particle diameter of 160nm, and a localized surface plasmon resonance wavelength of 780nm.

[0035] (1) Choose the quartz glass that size is 1cm * 1cm two-sided fine polishing as chip substrate, substrate is cleaned, hydrophilic treatment; Get diameter and be 430nm, concentration is the monodisperse polystyrene nanosphere aqueous solution 6 micrometers of 10%. Dropping onto a glass substrate for self-assembly, and drying at room temperature to obtain a single-layer array of polystyrene nanospheres;

[0036](2) Etching the self-assembled polystyrene nanospheres with a reactive ion etching machine using oxygen, the power is 5W, the oxygen flow rate is 20SCCM, and the etching time is 240s;

[0037] (3) Put the etched polystyrene nanospheres into the working chamber of the vacuum coating system at 2.8×10 -4 Deposit a layer of silver film o...

Embodiment 3

[0041] Example 3, using the present invention to test the stability of a surface-enhanced Raman chip with a structural period of 430nm and a particle diameter of 160nm with a localized surface plasmon resonance wavelength of 780nm.

[0042] (1) Choose the quartz glass that size is 1cm * 1cm two-sided fine polishing as chip substrate, substrate is cleaned, hydrophilic treatment; Get diameter and be 430nm, concentration is the monodisperse polystyrene nanosphere aqueous solution 6 micrometers of 10%. Dropping onto a glass substrate for self-assembly, and drying at room temperature to obtain a single-layer array of polystyrene nanospheres;

[0043] (2) Etching the self-assembled polystyrene nanospheres with a reactive ion etching machine using oxygen, the power is 6W, the oxygen flow rate is 20SCCM, and the etching time is 190s;

[0044] (3) Put the etched polystyrene nanospheres into the working chamber of the vacuum coating system at 2.6×10 -4 Deposit a layer of silver film on...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Diameteraaaaaaaaaa
Diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method and an application method for a high-sensitivity and high-stability surface-enhanced Raman chip. The method comprises the following steps of: preparing a polystyrene nanosphere array which is distributed in a single layer on a dual-surface-polished quartz substrate of (1 centimeter)*(1 centimeter) through a self-assembly method; etching the prepared single-layer nanosphere array by using a reaction ion etching process to changing the sizes of gaps among nanospheres; and manufacturing a surface-enhanced Raman chip of which the structural period is 430 nanometers, the particle diameter is 160 nanometers and the local surface plasma resonance wavelength is 780 nanometers through silver nano-film deposition and a Lift off process. The surface-enhanced Raman chip disclosed by the invention can be used for detecting a rhodamine 6G molecule of which the concentration is 10nM; and the characteristic peak strength deviation of a Raman spectrum curve of the rhodamine 6G molecule of which the concentration is 10nM at seven different positions on the same surface-enhanced Raman chip with high sensitivity and high stability is + / -3 percent, and the rapid specific detection requirements of biological and chemical substances can be met.

Description

technical field [0001] The invention is a preparation method and an application method of a high-sensitivity, high-stability surface-enhanced Raman chip. The chip is made by combining nanosphere lithography (NSL) technology with reactive ion etching technology, and the chip realizes low concentration Rapid detection of the rhodamine 6G molecule. Background technique [0002] Surface-enhanced Raman scattering (SERS) spectroscopy has high specificity and high sensitivity, and has been widely used in gene and protein identification, biological warfare agent detection, real-time monitoring of glucose, single-molecule detection, rapid identification of viruses and bacteria, trace explosion As the main carrier of the surface-enhanced Raman scattering effect and the key to realize the amplification effect of the surface-enhanced Raman scattering, the new surface-enhanced Raman scattering substrate has become a research hotspot in this field in recent years. The electromagnetic enh...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01N21/65
Inventor 罗先刚高平杨欢赵泽宇冯沁陶兴刘玲刘凯鹏杨磊磊
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products