Double-stage revolving and switching method and apparatus based on independent synchronic direction-regulation

Abstract

The invention relates to a double-stage revolving and switching method and a double-stage revolving and switching apparatus based on independent synchronic direction-regulation. The invention belongs to semiconductor device manufacturing equipments. The apparatus comprises a revolving stage-switching apparatus formed by a revolving stage-switching motor stator, a revolving stage-switching motor mover, and a rotary joint. Spinning apparatuses are provided on working stages. The spinning apparatuses comprise spinning motor stators, spinning motor movers, and spinning motor mover switching pieces. The revolving stage-switching apparatus is connected with the spinning motor mover switching pieces, such that the working stages can be driven to rotate around the center of a base stage. Therefore, position switching can be realized. With the apparatus provided by the invention, problems of inversed phases, twisted cables, and laser interferometer target loss of existing revolving stage-switching technologies can be solved. The apparatus is advantaged in small inertia moment, short stage-switching time with a same torque condition, high working stage operation efficiency, and high mask aligner yield.

Description

technical field [0001] The invention belongs to semiconductor manufacturing equipment, and mainly relates to a method and device for rotating and exchanging double worktables based on autonomous synchronous direction adjustment. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. The resolution and engraving accuracy of the lithography machine determine the minimum line width of the integrated circuit chip. At the same time, the yield of the lithography machine greatly affects the production cost of the integrated circuit chip. As the key subsystem of the lithography machine, the workpiece table It also determines the resolution, overlay accuracy and productivity of the lithography machine to a large extent. [0003] Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and overlay accuracy, improvi...

AI Technical Summary

Problems solved by technology

The invention adopts a three-beat double-stage rotation switch. During the stage change process, the workpiece table does not spin, which solves the problems of the existing rotary table scheme, the phase inversion of the workpiece table, the winding of cables, and the loss of the target of the laser interferometer.

At the same time, the present invention adopts the platform changing method that the workpiece table rotates around the center of the abutment, avoids rotating the whole abutment, and solves the problems of large radius of gyration and large moment of inertia in the prior art, and the moment of inertia is small. Shorter times improve workbench operating efficiency and lithography machine productivity

The present invention also solves the problems of large impact torque and many beats in the existing linear channel change scheme, and can adopt a smaller mass balance system, which is beneficial to shorten the balance time, simplify the system at the same time, reduce costs, and shorten the cycle time of channel change. It takes less time to change the platform, which can effectively improve the productivity of the lithography machine

Images