Double workpiece stage rotary exchange device based on synchronous gear direction adjustment

Abstract

A double workpiece stage rotary exchange device based on synchronous gear direction adjustment belongs to semiconductor manufacturing equipment; the device comprises a rotary stage-exchange device composed of a rotating motor stator, a rotating motor mover, a rotary stage-exchange gear, and a rotating connecting member; a workpiece stage rotating ring sleeve and a workpiece stage gear are disposed at the waist part of a workpiece stage; a workpiece connecting device is disposed at the side surface; after the rotary stage-exchange device is docked with the workpiece connecting device, the workpiece stage is driven to rotate around a base stage center so as to realize position exchange; during the three-beat rotary stage exchange process of the invention, the workpiece stage does not spin, which solves the problems of workpiece stage phase reversal, cable winding, and laser interferometer object loss in current rotary stage exchange modes; meanwhile the invention adopts a stage exchange mode in which the workpiece stage rotates around a base stage center, which avoids the rotation of the whole base stage, provides less rotary inertia and shorter stage exchange time under a condition with a same torque, and increases the operation efficiency of the workpiece stage and the yield of a lithography machine.

Description

Technical field [0001] The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a dual-workpiece table rotation exchange device based on synchronous gear direction adjustment. Background technique [0002] Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. The resolution and engraving accuracy of the lithography machine determine the minimum line width of the integrated circuit chip. At the same time, the yield of the lithography machine greatly affects the production cost of the integrated circuit chip, and the work table is the key subsystem of the lithography machine. It also largely determines the resolution, overlay accuracy and productivity of the lithography machine. [0003] Yield is one of the main goals pursued in the development of lithography machines. Under the condition of meeting the resolution and overlay accuracy, improving the operat...

AI Technical Summary

Problems solved by technology

In the present invention, the double-table rotation is switched to three beats, and the workpiece table does not spin during the table-changing process, which solves the problems of phase inversion of the workpiece table, cable entanglement, laser interferometer target loss, etc.

At the same time, the present invention adopts the platform changing method that the workpiece table rotates around the center of the abutment, avoids rotating the whole abutment, and solves the problems of large radius of gyration and large moment of inertia in the prior art, and the moment of inertia is small. Shorter times improve workbench operating efficiency and lithography machine productivity

The present invention also solves the problems of large impact torque and many beats in the existing linear channel change scheme, and can adopt a smaller mass balance system, which is beneficial to shorten the balance time, simplify the system at the same time, reduce costs, and shorten the cycle time of channel change. It takes less time to change the platform, which can effectively improve the productivity of the lithography machine

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