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Manufacturing method of micro fluxgate sensor with amorphous magnetic core

A technology of fluxgate sensor and magnetic core, which is applied in the field of preparation of micro-electromechanical technology, can solve the problems of sensor damage, difficulty in reducing the size of fluxgate sensor, etc., and achieves avoidance of oxidation, good resistance to environmental influences, excellent The effect of mechanical properties

Inactive Publication Date: 2010-11-17
SHANGHAI JIAO TONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the need to drill through holes in the manufacturing process to realize the coil winding on the magnetic core, the sensor may be damaged during the through hole process
Also, it is difficult to reduce the size of the fluxgate sensor according to this method compared to MEMS technology

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] (1) Sputter a Cr / Cu bottom layer on one side of the substrate (referred to as the front side), with a thickness of 80nm. Subsequent processes are all carried out on the front side;

[0041] (2) Spin-coat the positive resist, the thickness of the photoresist is 15 μm, the photoresist drying temperature is 95 ° C, and the time is 60 minutes; exposure and development, the bottom coil of the excitation coil and the induction coil and the photoresist of the positioning mark are obtained Graphics; then electroplating the bottom coil of the excitation coil and the induction coil and the positioning mark, the thickness is 15 μm, and the plating material is copper; the positive resist is spin-coated, the thickness of the photoresist is 40 μm, the photoresist drying temperature is 90 ° C, and the time is 120 minutes; exposure, development, to obtain the photoresist pattern connecting the conductor and the positioning mark; electroplating the connecting conductor and the positioni...

Embodiment 2

[0047] (1) Sputter a Cr / Cu bottom layer on one side of the substrate (referred to as the front side), with a thickness of 80nm. Subsequent processes are all carried out on the front side;

[0048] (2) Spin-coat the positive resist, the thickness of the photoresist is 20 μm, the photoresist drying temperature is 95 ° C, and the time is 60 minutes; exposure and development, the bottom coil of the excitation coil and the induction coil and the photoresist of the positioning mark are obtained Graphics; then electroplate the bottom coil of the excitation coil and the induction coil and the positioning mark, the thickness is 20 μm, and the electroplating material is copper; the positive resist is spin-coated, the thickness of the photoresist is 40 μm, the photoresist drying temperature is 90 ° C, and the time is 120 minutes; exposure, development, to obtain the photoresist pattern connecting the conductor and the positioning mark; electroplating the connecting conductor and the posi...

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Abstract

The invention discloses a manufacturing method of a micro fluxgate sensor with an amorphous magnetic core, belonging to the technical field of micro electronmechanical systems. The manufacturing method comprises the following steps of: sputtering a Cr / Cu bottom layer on one surface of a substrate; spinning a positive photoresist and baking to obtain bottom coils of an excitation coil and an induction coil and photoresist graph of a positioning mark; electroplating the bottom coils and the positioning mark; spinning the positive photoresist to obtain a bonding conductor and the photoresist graph of the positioning mark; electroplating the bonding conductor and the positioning mark; removing the photoresist and etching the Cr / Cu bottom layer; spinning polyimide; spinning the polyimide, adhering prefabricated amorphous magnetically soft alloy magnetic cores one by one and baking; spinning the polyimide, baking and curing; polishing the polyimide until the bonding conductor is exposed; sputtering the Cr / Cu bottom layer; spinning the positive photoresist and baking to obtain the top coils of the excitation coil and the induction coil and the photoresist graph of an electrode; electroplating the bottom coils and the electrode; and removing the photoresist and etching the Cr / Cu bottom layer to obtain the sensor which has high sensitivity and wide linear measurement range.

Description

technical field [0001] The present invention relates to a preparation method in the field of micro-electromechanical (MEM) technology, in particular to a preparation method of an amorphous magnetic core miniature fluxgate sensor. Background technique [0002] As a traditional weak magnetic field detection device, the fluxgate sensor has always had its unique advantages and cannot be replaced by other magnetic field sensors. In recent years, it has continuously discovered its application potential in new fields, such as GPS positioning of small mobile devices, Missile inertial guidance, small satellite azimuth and attitude control, motion detection in virtual reality space, geomagnetic compensation and point noise compensation for high-definition television (HDTV), etc. In recent years, since applications of various fields have been gradually expanded, requirements for devices tend to be thinner, lighter, and cheaper. Correspondingly, fluxgate sensors are also trying to beco...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00G01R33/04
Inventor 雷冲周勇
Owner SHANGHAI JIAO TONG UNIV
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