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Strong magnetic film medium and preparation method thereof

A strong magnetic, thin film technology, applied in the application of magnetic film to substrate, magnetic layer, cathode sputtering application, etc., can solve the problems of complex process and high cost, achieve simple process, good magnetic field direction, small volume Effect

Inactive Publication Date: 2010-09-01
SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

ThomasBudde and Hans H.Gatzen, Thin film SmCo magnets for use in electromagneticmicroactuators, Journal of Applied Physics, 99, 08N304 (2006) studied the use of ion beam etching and wet chemical etching to obtain patterned films that generate magnetic fields, the process is complex, high cost

Method used

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  • Strong magnetic film medium and preparation method thereof
  • Strong magnetic film medium and preparation method thereof

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Embodiment 1

[0018] First prepare a clean and dry Si substrate 11; then cover a mask plate (not shown) on the surface of the Si substrate 11 and press it tightly. The background vacuum of the system is better than 1×10 -4 Pa, heat the Si substrate to 11 to 200-500°C, and the working pressure is 0.2-5Pa; grow Ti, Cr, Ta, Mo, etc. step by step by magnetron sputtering, electron beam evaporation or pulsed laser deposition. The buffer layer 12 of the film, the permanent magnet film 13 of NdFeB, SmCo, AlNiCo, etc. and keep it warm for 1 hour; then raise the temperature to 550-800°C for secondary annealing; grow SiO when cooling to room temperature 2 , SiN, Cr, Ta and other thin-film protective layers 14; finally, use a magnetizer to magnetize and magnetize the thin-film medium.

Embodiment 2

[0020] First prepare a clean and dry Si substrate 11; then grow a buffer layer 12 and a permanent magnetic film 13 on the Si substrate 11 under vacuum conditions, heat it up to 550-800° C. for secondary annealing after 1 hour of heat preservation; then cool to Growth of SiO at room temperature 2 , SiN, Cr, Ta and other thin-film protective layers 14; then use laser ablation of the thin film to obtain laminated thin films with different geometric shapes; finally use a magnetizer to magnetize and magnetize the thin-film medium.

[0021] In summary, the present invention proposes a ferromagnetic thin film medium and a preparation method thereof. The permanent magnet thin film is directly grown by using a mask plate or the permanent magnet thin film is grown and then the thin film is ablated by a laser, and then magnetized and magnetized to obtain a thin film medium. The thin film medium obtained by this scheme has a small volume, and the size reaches the micron level; the magnet...

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Abstract

The invention discloses a strong magnetic film medium, which has a laminated structure consisting of a buffer layer, a permanent magnetic film and a protective layer on a substrate material. A preparation method comprises the following steps of: firstly, preparing a clean and dry Si substrate, and growing and preparing the buffer layer on the surface of the substrate; secondly, preparing the permanent magnetic film and the protective layer with geometrical shapes in turn on the buffer layer by adopting a mask growth method or a growth ablation method under a vacuum condition; and finally, magnetizing the film medium by using a magnetizer. The application of the technical scheme of the invention reduces the size of a permanent magnetic material to micron magnitude; and the film medium generating a large magnetic field has the advantages of small volume, high magnetic field strength, good magnetic field directivity, simple design, high reliability and the like. In addition, the method for preparing the film medium has the advantages of simple process and broader application field.

Description

technical field [0001] The invention relates to a thin film medium and a preparation method thereof, in particular to a strong magnetic thin film medium capable of generating a large magnetic field and applied to the fields of microfabrication, bias magnetoresistive devices, anti-magnetic levitation, atomic particle manipulation, magnetic storage, and the like. Preparation. Background technique [0002] Permanent magnetic materials have the function of mutual conversion between mechanical energy and electromagnetic energy. Using its energy conversion function and various physical effects of magnetism, such as magnetic resonance effect, magnetomechanical effect, magnetochemical effect, magnetic biological effect, magnetic effect, magnetoresistance effect, Hall effect, etc., permanent magnet materials can be made into various Various forms of permanent magnet functional devices. These permanent magnet functional devices have become the core functional devices in high-tech fi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01F10/10H01F41/14H01F41/18
Inventor 焦新兵蒋春萍王亦
Owner SUZHOU INST OF NANO TECH & NANO BIONICS CHINESE ACEDEMY OF SCI
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