SiO2/perfluorinated sulfonic resin compound proton exchange membrane and preparation method thereof
A perfluorosulfonic acid resin and proton exchange membrane technology, applied in the field of proton exchange membranes, can solve the problems of uneven distribution of inorganic oxide particles and affect the conductivity of proton exchange membranes, achieve good water retention capacity and mechanical strength, and facilitate electrical conductivity rate, the effect of high conductivity
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Embodiment 1
[0042](1) Under magnetic stirring conditions, 0.6 mmol of cerium nitrate was dissolved in 500 milliliters of ethanol-water mixed solvent to prepare a cerium nitrate solution.
[0043] (2) 2.5mol of Triton X-100 is added to 500ml of tetraethyl orthosilicate (TEOS) in ethanol solution, the concentration of tetraethyl orthosilicate is 0.4mol / L, use nitric acid solution to adjust pH=2, Ultrasonic treatment for 30 minutes to form a silicon source solution; the cerium nitrate solution obtained in (1) was slowly added dropwise to the obtained silicon source solution, and the ultrasonic treatment was continued for 40 minutes to form a stable sol, and a 0.3% cerium ion doping amount was obtained. Silica sol.
[0044] (3) Take a certain amount of perfluorosulfonic acid resin (EW900) and dissolve it in a dimethyl sulfoxide-ethanol mixed solution to prepare a perfluorosulfonic acid resin solution with a concentration of 20 wt%. Then, slowly add the sol obtained in (2) into the resin solu...
Embodiment 2
[0047] Dissolve 1 mmol of cerium nitrate in 500 ml of methanol-water mixed solvent, and prepare a cerium nitrate solution evenly under magnetic stirring.
[0048] The polymer block copolymer surfactant P123 of 2mol is joined in the N,N-dimethylacetamide solution of 500ml tetraethyl orthosilicate (TEOS), and the concentration of tetraethyl orthosilicate is 0.4mol / L, Use nitric acid solution to adjust pH=2, sonicate for 30 minutes to form a silicon source solution; slowly add the gained cerium nitrate solution dropwise into the gained silicon source solution, continue ultrasonic treatment for 40 minutes to form a stable sol, and obtain a cerium ion doping amount of 0.5% silica sol.
[0049] A certain amount of perfluorosulfonic acid resin (EW900) was dissolved in N,N-dimethylacetamide-methanol mixed solvent to prepare a perfluorosulfonic acid resin solution with a concentration of 20 wt%. Then, the above-mentioned silica sol was slowly added into the resin solution, and magneti...
Embodiment 3
[0052] Dissolve 2 mmol of cerium nitrate in 500 ml of ethylene glycol-water mixed solvent, and prepare a cerium nitrate solution evenly under magnetic stirring.
[0053] Add 0.6mol of cetyltrimethylammonium bromide to 500ml of tetraethyl orthosilicate (TEOS) in n-butanol solution, the concentration of tetraethyl orthosilicate is 0.4mol / L, use nitric acid solution to adjust pH =2, sonicate for 30 minutes to form a silicon source solution; the cerium nitrate solution obtained above is slowly added dropwise to the gained silicon source solution, and continue to be sonicated for 40 minutes to form a stable sol, and the obtained cerium ion doping amount is 1%. Silica sol.
[0054] A certain amount of perfluorosulfonic acid resin (EW1100) was dissolved in N,N-dimethylformamide solvent to prepare a perfluorosulfonic acid resin solution with a concentration of 15 wt%. Then, the above-mentioned silica sol was slowly added into the resin solution, and magnetically stirred for 3 hours t...
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