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Method for preparing L10 type ultrahigh density magnetic record metal thin film

A magnetic recording and metal thin film technology, applied in magnetic recording, magnetic layer, data recording, etc., can solve the problems of harsh deposition conditions, increased magnetic recording density, and high equipment requirements

Inactive Publication Date: 2009-12-02
BEIJING UNIV OF CHEM TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In order to overcome the disadvantages of harsh deposition conditions, high equipment requirements, and high production costs of this preparation method, the preparation of alloy films mainly containing ferromagnetic metals such as Co or Fe and noble metals such as Pt or Pd by electrochemical deposition has become a solution to the current increase. One of the important research directions of magnetic recording density

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] 1) prepare the electrolyte solution of two kinds of metal ions:

[0023] ①Add 30ml of 0.03mol / l ammonium tartrate solution to a 50ml beaker, then add 10ml of 0.015mol / l CoCl 2 .6H 2 Pour the O solution into the ammonium tartrate solution, stir in a water bath at 60°C to obtain a purple turbid liquid, add 5% ammonia water to dissolve it, and adjust the pH value of the solution to 9;

[0024] ②Add 10ml of 0.35mol / l H to a 50ml beaker 2 PtCl 6 .6H 2 O solution, heated and stirred at 95°C until the precipitate was dissolved to obtain a yellow-brown solution, and 5% ammonia water was added dropwise to adjust the pH value of the solution to 9;

[0025] ③ Mix the solutions prepared in steps ① and ②, and adjust the pH value of the solution to 9 with 5% ammonia water;

[0026] 2) The single crystal silicon wafer of the substrate is treated by chemical polishing, and then the ion sputtering gold layer is about 10m;

[0027] 3) The substrate treated in step 2) is used as a c...

Embodiment 2

[0031] 1) prepare the electrolyte solution of two kinds of metal ions:

[0032] ①Add 10ml of 0.03mol / l ammonium tartrate solution to a 50ml beaker, then add 10ml of 0.015mol / l CoCl 2 .6H 2 Pour the O solution into the ammonium tartrate solution, stir in a water bath at 60°C to obtain a purple turbid liquid, add 5% ammonia water to dissolve it, and adjust the pH value of the solution to 9;

[0033] ②Add 10ml of 0.35mol / l dinitrosodiammine platinum solution into a 50ml beaker, heat and stir at 95°C until the precipitate dissolves, and obtain a yellow-brown solution, drop 5% ammonia water to adjust the pH value of the solution to 9;

[0034] ③ Mix the solutions prepared in steps ① and ②, and adjust the pH value of the solution to 9 with 5% ammonia water;

[0035] 2) Surface treatment of the copper foil substrate by electrochemical polishing;

[0036] 3) The substrate treated in step 2) is used as a cathode, the platinum electrode is used as an anode, a DC power supply and an e...

Embodiment 3

[0040] 1) prepare the electrolyte solution of two kinds of metal ions:

[0041] ①Add 30ml of 0.1mol / l ammonium tartrate solution into a 50ml beaker, then pour 10ml of 0.2mol / l ferrous sulfate solution into the ammonium tartrate solution, stir to obtain a light yellow colloid, drop in concentrated ammonia water to make It dissolves and adjusts the pH of the solution to 8.5;

[0042]②Add 30ml of 0.05mol / l citric acid solution into a 50ml beaker, then add 10ml of 0.1mol / l palladium chloride, heat and stir until the precipitate dissolves, and obtain a yellow-brown solution. Adjust the pH value of the solution to 8.5 with concentrated ammonia water ;

[0043] ③ Mix the solutions prepared in steps ① and ②, then add 10ml of 0.5mol / l ammonium chloride solution, and adjust the pH value of the solution to 8.5 with concentrated ammonia water;

[0044] 2) The surface of the single crystal MgO sheet is treated by chemical polishing, and then the ion sputtering gold layer is about 10m;

...

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PUM

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Abstract

A method for preparing L10 type ultrahigh density magnetic record metal thin film belongs to the field of magnetic recording, storing and representation information recording. The existing magnetic recording metal thin film preparation method has the problems of rigorous conditions, high requirement of equipment, high production cost and the like. The invention prepares an alloy thin film mainly containing ferro magnetic metal A (Fe, Co or Ni) and precious metal B (Pt, Pd, Ag or Au) by electrochemical co-deposition method, controls the atom content of A to be 50% and obtains ultrahigh density magnetic recording metal thin film of vertical superlattice structure (L10 type). The thin film prepared by the invention has homotaxial magnetocrystalline anisotropy (K), ultrahigh coercivity, excellent physical and chemical stability, potential application prospect in micro-electronics storage field and ultrahigh density magnetic recording material.

Description

technical field [0001] The invention belongs to the field of magnetic recording, storage and reproduction information recording, and in particular relates to a L1 0 A method for preparing a metal film for ultra-high-density magnetic recording (superlattice structure). Background technique [0002] With the advancement of science and technology, especially the rapid development of the information industry and communication industry, people have higher and higher requirements for the magnetic recording performance of magnetic materials. The magnetic recording performance of many traditional magnetic materials can no longer meet the requirements of the technological development of the times. It is well known that in order to achieve high-density recording on a recording medium, the diameter of the magnetic grains in the recording film must be reduced as much as possible, and intergranular regions of crystals are provided between those magnetic grains to weaken the magnetic coup...

Claims

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Application Information

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IPC IPC(8): G11B5/66G11B5/84H01F10/12C25D3/56C25D5/00C25D5/54C25D5/50
Inventor 王峰赵永彬刘景军王建军张良虎
Owner BEIJING UNIV OF CHEM TECH
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