Method for preparing vertical structure LED using whole optical film system
A light-emitting diode, vertical structure technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of low light extraction efficiency, poor heat dissipation capacity, uneven current distribution, etc.
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[0029] see Figure 1-Figure 4 As shown, a method for manufacturing a vertical structure light-emitting diode using an all-optical film system in the present invention comprises the following steps:
[0030] Step 1: Epitaxially grow GaN N-type contact layer 11, multi-quantum well active region 12 and GaN P-type contact layer 13 sequentially on substrate 10 by metal chemical organic vapor deposition method, the substrate 10 is sapphire Substrate;
[0031] Step 2: Use inductively coupled plasma, electron cyclotron resonance, and reactive ion etching dry etching techniques for device isolation;
[0032] Step 3: Fabricate an ITO optical film 20 on the GaN P-type contact layer 13 by electron beam evaporation technology;
[0033] Step 4: Make a layer of optical high-reflection film 21 on the ITO optical film 20 by using ion beam sputtering technology. The high-reflection film adopts a mesh structure, that is, part of the ITO optical film 20 is covered by the optical high-reflection...
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