Thermosetting epoxy resin composition and semiconductor device
A technology of epoxy resin and composition, applied in the direction of semiconductor devices, semiconductor/solid-state device parts, electric solid-state devices, etc., can solve the problem of yellowing of epoxy resin composition, and achieve excellent curability, uniform good strength effect
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[0085] Preparation method of epoxy resin composition
[0086] As a method for preparing the epoxy resin composition of the present invention as a molding material, (A), (B) components, preferably (A), (B), and (C) components are mixed in advance, and the A temperature range of 70 to 120°C, preferably 80 to 110°C, or each component of (A), (B), (D) or (A), (B), (C), (D) in advance Mixing is carried out at a temperature range of 30 to 80°C, preferably 40 to 60°C, using a device such as a reactor that can be heated without a solvent to uniformly melt and mix, and the mixture must be viscosified to a sufficient softening point for use at normal temperature. Specifically, the epoxy resin is cooled at 50 to 100° C., more preferably 60 to 90° C., to obtain a solidified mixture.
[0087] In this case, the temperature range for mixing these components is preferably 70 to 120° C., and more preferably 80 ~ 110 ℃ range. When the mixing temperature is lower than 70°C, the temperature ...
Embodiment 1~4、 comparative example 1、2
[0116] Among the components shown in Table 1, the (reaction) components were melt-mixed under the conditions shown in the table, and the obtained reaction solids were pulverized, and this was used as a (post-blending) component to obtain an epoxy resin composition.
[0117] Properties of the above-mentioned reaction solids and cured products obtained by curing the above-mentioned epoxy resin compositions with a transfer molding machine were investigated by the following methods. The results are summarized in Table 1.
[0118] Reaction solids
[0119] The reaction solids were subjected to GPC analysis under the following conditions.
[0120] (GPC analysis conditions)
[0121] Using HLC-8120 (device manufactured by Tosoh Corporation), on the column: TSKguardcolumnHXL-L+G4, 3, 2, 2HxL, sample concentration 0.2%, injection volume 50μL, mobile phase THF 100%, flow rate 1.0mL / min, temperature Under the condition of 40°C, the measurement was performed with detector RI.
[0122]...
Embodiment 1
[0143] The reaction solids of embodiment 1
[0144] X 51.6
[0145] Y 16.2
[0146] Z 27.0
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