Positive photoresist composition, thick film photoresist laminate, method for producing thick film resist pattern, and method for producing connecting terminal
A photoresist layer, photoresist technology, applied in photosensitive materials for photomechanical devices, use/removal methods of circuit masks, photomechanical devices, etc., can solve the problem of not being able to obtain high precision Resist patterns, etc.
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Embodiment 1
[0256] [Synthesis Example 1]
[0257] After replacing the atmosphere in the flask equipped with a stirrer, a reflux condenser, a thermometer, and a dropping tank, propylene glycol methyl ether acetate was charged as a solvent, and stirring was started. Then, the temperature of the solvent was raised to 80°C. 2,2'-Azobisisobutyronitrile as a polymerization catalyst, 30 mol% of 2-methoxyethyl acrylate constituting units, 10 mol% of n-butyl acrylate constituting unit, 55 mol% of 2-ethyl-2-adamantyl methacrylate constituting unit represented by the following chemical formula, and 5 mol% of acrylic acid constituting unit, followed by stirring until the polymerization catalyst was dissolved. This solution was uniformly added dropwise to the flask over 3 hours, followed by polymerization at 80°C for 5 hours. The reaction product was cooled to room temperature, and then classified to obtain a resin (B-1) having a mass average molecular weight of 30,000.
Embodiment 2
[0258] [Synthesis Example 2]
[0259] In addition to using 30 mol% of 2-methoxyethyl acrylate constituting unit, 10 mol% of n-butyl acrylic acid constituting unit, 55 mol% of 2-ethyl-2-adamantyl methacrylate constituting unit represented by the following chemical formula In the same manner as in Synthesis Example 1 except for 5 mol% of acrylic acid constituting units as constituting units, a resin (B-2) having a mass average molecular weight of 100,000 was obtained.
[0260] [chemical formula 27]
[0261]
Embodiment 3
[0263]
[0264] Resin (C-1) having a mass average molecular weight of 1,500 was obtained in the same manner as in Synthesis Example 1 except that 10 mol% of hydroxystyrene constituting units and 90 mol% of styrene constituting units were used as constituting units.
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