Composite plating process and equipment for magnetron sputtering-laser heating

Abstract

The invention discloses the magnetron sputtering-laser heating composite diffusion coating technology and the equipment, by utilizing the magnetron sputtering and a laser heating device, a single diffusion coating layer or a composite diffusion coating layer with a diffusion layer and a sedimentary layer or the diffusion layer plus the sedimentary layer which comprises metal element and nonmetal element is formed on the surface of a conducting workpiece. The invention has the advantages that by utility a magnetron sputtering target, sufficient pre-diffusing alloy element can be provided; by utilizing the laser heating, the diffused material can heated to high temperature in a short time and the diffusing speed is greatly increased; the DEG Cree of vacuum of the metal for diffusing is increased at least one order of magnitude compared with the common alloying method, and the surface quality of the diffused workpiece can be greatly improved; the diffusion coating can be performed continuously, and the production in large area and large scale can be realized.

Description

Technical field: [0001] The invention relates to plasma surface metallurgy, in particular to a magnetron sputtering-laser heating composite diafiltration process and equipment capable of forming an alloy layer on the surface of a conductive material. Background technique: [0002] At present, various equipment and processes for plasma surface modification using gas discharge mainly include: double-layer glow ion plating metal plating equipment and technology, multi-arc ion plating equipment and technology, magnetron sputtering ion plating equipment and technology, DC two-pole sputtering, DC three-pole or four-pole sputtering plating equipment and technology, etc. Among the above equipment and process methods, except for the double-layer glow ion infiltration metallization equipment and technology, the rest of the equipment and process technologies all form a deposited coating on the surface of the material without a diffusion layer. Therefore, the bonding strength of the fi...

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Problems solved by technology

Among the above equipment and process methods, except for the double-layer glow ionized metal infiltration equipment and technology, the rest of the equipment and process technologies all form a deposition coating on the surface of the material without a diffusion layer.

Therefore, the bonding strength of the film base is poor, and it is easy to peel off

The double-layer glow ionization metallization equipment and technology adopts the diode-type glow discharge sputtering to provide the alloying elements to be infiltrated. Due to the low ionization rate, the number of alloying elements to be infiltrated per unit time is limited, making the surface metallization process affected

In addition, when the double-layer glow ion infiltrates the metal, the infiltrated workpiece is heated by ion bombardment, the heating speed is slow, the time is long, and the grain grows seriously.

The diffusion of alloy atoms to be infiltrated is mainly intragranular diffusion, and the diffusion speed is very low

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