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Preparation method of filling type sub-wavelength guide mode resonance optical filter

A technology of guided mode resonance and sub-wavelength gratings, which is applied in the direction of optical filters, optical mechanical equipment, and photolithography on patterned surfaces. It can solve the problems of difficult materials and difficult preparation of optical filters.

Inactive Publication Date: 2008-05-14
UNIV OF SHANGHAI FOR SCI & TECH
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Problems solved by technology

However, there are still no mature products of this type at home and abroad. The main reason is that it is difficult to prepare the filter with the designed structure under the actual process conditions, especially for the filled subwavelength guided mode resonant filter. Filler, since the groove width of the grating is on the order of nanometers, it is extremely difficult to fill the groove with a certain thickness of material once the air-filled grating is etched. So far, no filled subwavelength guide has been seen. Mode Resonance Filter Fabrication Reported

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  • Preparation method of filling type sub-wavelength guide mode resonance optical filter

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Embodiment Construction

[0016] The present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0017] The purpose of this embodiment is to prepare a filled sub-wavelength guided mode resonant filter, which has a resonance effect on the 632.8nm TE wave incident at 57.88 degrees. The structure is shown in Figure 1. The specific parameters are: the grating period is 266nm, the duty ratio is 1:1, the groove 1 and the groove land 2 are made of quartz material and hafnium oxide material respectively, and the groove depth is 178nm. Specific steps are as follows:

[0018] (1) Make a mask on the quartz substrate by photolithography technology, transfer the mask structure to the quartz substrate by reactive ion beam etching technology, and prepare the initial air-filled subwavelength grating. Then use it as the substrate for coating and etching. The parameters of the grating structure obtained after transfer are: period 266nm, duty ratio 1:1, the groov...

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Abstract

The invention relates to a production method of a filling type subwavelength guided mode resonance light filtering piece. The initial air filling type subwavelength grating is produced by adopting methods of plate covering light charactering and reaction ion beam etching, then film plating and etching are proceeded by taking the air filling type subwavelength grating as the base piece. The invention is characterized in that: a) a film plating uses a method of physics vacuum sediment, the material of the film is the material being filled in a grating groove and the thickness of the film is 2 times of the depth of the subwavelength grating groove; b) the reaction ion beam is used for etching the light filtering piece being plated, the etching thickness is 2 times of the depth of the subwavelength grating groove. The invention fills the material, the thickness of which has the exactitude to the nanometer grade in the grating groove with nanometer yardstick and which no doubt is one of the production in the light filtering pieces with the most difficult. The invention combines the plating technique and the etching technique to provide a practical and feasible etching production method; the method used can conveniently produce filling type subwavelength guided mode resonance light filtering pieces.

Description

technical field [0001] The patent of the present invention relates to the preparation method of the filled sub-wavelength guided mode resonant filter, and specifically relates to the etching technology of the grating structure and the vacuum coating technology. Background technique [0002] The phenomenon of subwavelength guided mode resonance has been studied earlier, but it is still a hot physical problem in recent years. This physical phenomenon can be used to make sub-wavelength guided mode resonant filters. Compared with traditional thin-film filters, this type of filter has the following advantages: (1) extremely narrow bandwidth, which can theoretically reach 0.01nm; ( 2) Extremely high reflection, which can reach 100% in theory; (3) Few layers, single layer or two to three layers; (4) Thin film layer thickness error is not strict. With its incomparable advantages, subwavelength guided mode resonant narrowband filters attract more and more scientific researchers to e...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20G03F7/00
Inventor 张大伟黄元申倪争技庄松林
Owner UNIV OF SHANGHAI FOR SCI & TECH
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