Method for surface treating calender copper foil of printing circuit board
A technology of printed circuit boards and rolled copper foils, applied in the secondary treatment of printed circuits, improvement of metal adhesion of insulating substrates, etc. Improve corrosion resistance, fast oil removal, good roughening effect
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Embodiment 1
[0021] The technological process and steps of the present embodiment are as follows:
[0022] (1) Weak alkaline degreasing treatment: put the 35μm rolled copper foil in Na 2 CO 3 10g / L, Na 3 PO 4 12H 2 O15g / L, Na 2 SiO 3 9H 2 O 5g / L weak alkaline mixed degreasing liquid, treated at a temperature of 50°C for 5 seconds; then rinsed with deionized water for 3 times, and washed with 12% dilute sulfuric acid for 2 times, and then deionized Rinse with water 3 times;
[0023] (2) Primary roughening treatment: the above-mentioned rolled copper foil after pickling is placed in a Cu-containing 2+ 15g / L, H 2 SO 4 30g / L, Cl - 4ppm, AS 5+ In a 0.4g / L electroplating solution, at a temperature of 20°C and a current density of 25A / dm 2 Copper electroplating was performed for 5 seconds under certain conditions; then rinsed 3 times with deionized water;
[0024] (3) Secondary roughening treatment: The rolled copper foil after the above treatment is roughened again, and placed...
Embodiment 2
[0029] The process and steps of this embodiment are exactly the same as those of Embodiment 1 above, except that some process parameters are changed.
[0030] (1) Weak alkaline degreasing treatment: put the 35μm rolled copper foil in Na 2 CO 315g / L, Na 3 PO 4 12H 2 O20g / L, Na 2 SiO 3 9H 2 O 8g / L weak alkaline mixed degreasing liquid, treated at 60°C for 5 seconds; then rinsed with deionized water for 3 times, and washed with 12% dilute sulfuric acid for 2 times, and then deionized Rinse with water 3 times;
[0031] (2) Primary roughening treatment: the above-mentioned rolled copper foil after pickling is placed in a Cu-containing 2+ 20g / L, H 2 SO 4 60g / L, Cl - 7ppm, AS 5+ In a 0.4g / L electroplating solution, at a temperature of 30°C and a current density of 35A / dm 2 Electroplate copper for 3 seconds under certain conditions; then rinse with deionized water 3 times;
[0032] (3) Secondary roughening treatment: The rolled copper foil after the above treatment i...
Embodiment 3
[0037] The process and steps of this embodiment are exactly the same as those of Embodiment 1 above, except that some process parameters are changed.
[0038] (1) Weak alkaline degreasing treatment: put the 35μm rolled copper foil in Na 2 CO 3 30g / L, Na 3 PO 4 12H 2 O30g / L, Na 2 SiO 3 9H 2 O 10g / L weak alkaline mixed degreasing liquid, treated at 60°C for 5 seconds; then rinsed with deionized water for 3 times, and washed with 12% dilute sulfuric acid for 2 times, and then deionized Rinse with water 3 times;
[0039] (2) Primary roughening treatment: the above-mentioned rolled copper foil after pickling is placed in a Cu-containing 2+ 35g / L, H 2 SO 4 90g / L, Cl - 10ppm, AS 5+ In a 0.4g / L electroplating solution, at a temperature of 30°C and a current density of 55A / dm 2 Copper electroplating was performed for 5 seconds under certain conditions; then rinsed 3 times with deionized water;
[0040] (3) Secondary roughening treatment: The rolled copper foil after ...
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