Low-radiation self-cleaning composite function glass and producing method
A composite function and low-radiation technology, which is applied in the field of low-radiation self-cleaning composite functional glass and its online preparation, can solve the problems that are difficult to achieve high transmittance, low radiation rate, glass transmittance reduction, etc., and achieve favorable Popularization and application, good physical and chemical properties, and the effect of reducing product cost
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Embodiment 1
[0023] The low-radiation self-cleaning composite functional glass described in this embodiment is a multi-film layer, and the layers from the outer layer to the inner layer are SiO 2 Transition layer, Sb 3+ , F - ion-doped SnO 2 Layer, La 3+ ion-doped SiO 2 -TiO 2 layer. Among them: SiO 2 The controlled thickness of the transition layer is 20nm, SnO2 The controlled thickness of the layer is 250nm, SiO 2 -TiO 2 The controlled thickness of the layer was 15 nm.
[0024] The SiO 2 Preparation: Mix ethyl orthosilicate, ethanol, deionized water, and nitric acid at a molar ratio of 1:14:6:0.03, and mix and stir at room temperature for 6 hours to make it hydrolyze to produce silica sol .
[0025] The SnO 2 Preparation: Mix stannous chloride dihydrate, deionized water, and ethanol in a molar ratio of 1:40:0.02, stir in a constant temperature reactor at 50°C for 20 hours, and then add An anhydrous ethanol solution of trifluoroacetic acid and antimony trichloride, the molar ...
Embodiment 2
[0033] The low-radiation self-cleaning composite functional glass described in this embodiment is a multi-film layer, and the layers from the outer layer to the inner layer are SiO 2 Transition layer, Sb 3+ ion-doped SnO 2 layer, Zn 2+ ion-doped SiO 2 -TiO 2 layer. Among them: SiO 2 The controlled thickness of the transition layer is 20nm, SnO 2 The controlled thickness of the layer is 200nm, SiO 2 -TiO 2 The controlled thickness of the layer was 20 nm.
[0034] The SiO 2 Preparation: Mix ethyl orthosilicate, ethanol, deionized water, and nitric acid at a molar ratio of 1:14:6:0.03, and mix and stir at room temperature for 6 hours to make it hydrolyze to produce silica sol .
[0035] The SnO 2 Preparation: Mix tin protochloride dihydrate, deionized water, and ethanol in a molar ratio of 1:40:0.02, stir in a constant temperature reactor at 50°C for 20 hours, and then add trichloride with a molar ratio of 0.04:40 Antimony trioxide and absolute ethanol solution, cont...
Embodiment 3
[0043] The low-radiation self-cleaning composite functional glass described in this embodiment is a multi-film layer, and the layers from the outer layer to the inner layer are SiO 2 Transition layer, F - ion-doped SnO 2 layer, Ag + ion-doped SiO 2 -TiO 2 layer. Among them: SiO 2 The controlled thickness of the transition layer is 20nm, SnO 2 The controlled thickness of the layer is 250nm, SiO 2 -TiO 2 The controlled thickness of the layer was 20 nm.
[0044] The SiO 2 Preparation: mix ethyl orthosilicate, ethanol and deionized water, then add organic acid or inorganic acid as catalyst, stir and mix at room temperature, make it hydrolyze and polymerize, and make silica sol. Ethyl orthosilicate: ethanol: deionized water: organic acid or inorganic acid are mixed in a molar ratio of 1:14:5:0.03.
[0045] The SnO 2 Preparation: Mix stannous chloride dihydrate, deionized water, and ethanol in a molar ratio of 1:40:0.02, stir at 80°C for 20 hours in a constant temperatur...
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