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Hall Ion Source excitation magnetron sputtering enhancement magnetism filtration multi-arc ion composite coating method

A multi-arc ion and composite coating technology, used in sputtering, ion implantation, vacuum evaporation, etc., can solve the problem of quality reduction, magnetron sputtering deposition rate, low film-base bonding strength, thin film, etc. problem, to achieve the effect of good bonding strength, significant strengthening effect, and high density bonding strength

Inactive Publication Date: 2007-10-24
西安宇杰表面工程有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, there are still some technical problems in various single-function PVD methods, such as the low deposition rate of magnetron sputtering and the low bonding strength of the film substrate; the droplets formed during the multi-arc ion plating deposition process make the film loose and reduce its quality.

Method used

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  • Hall Ion Source excitation magnetron sputtering enhancement magnetism filtration multi-arc ion composite coating method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Embodiment 1: Preparation of TiN hard film

[0025] 1. Put the workpiece 12 to be processed into the furnace reaction chamber 1 of the Hall source excited magnetron sputtering enhanced magnetic filter multi-arc ion coating equipment, and turn on the vacuum system 2 to evacuate to 6.0×10 -3 Pa, turn on the heating system 6, heat to 250°C and keep it stable until the coating is finished

[0026] 2. After heating and keeping warm for 30 minutes, turn on the Ar in the gas supply system 3, keep the Ar flow rate at 100ml / min, gradually increase the bias voltage and stabilize it at 900V, and the duty cycle is 50%. The high-energy ions in the plasma field generated by the bias power supply system 4-3 in the equipment bombard the surface of the workpiece for 30 minutes, so that the surface 12 of the workpiece to be treated is cleaned and activated;

[0027] 3. After the argon ion bombardment, restart the fine pumping system in the vacuum system 2 and adjust the pressure to 6.0×...

Embodiment 2

[0030] Embodiment 2: Preparation of TiC hard film

[0031] 1. Put the workpiece 12 to be processed into the furnace reaction chamber 1 of the Hall source excited magnetron sputtering enhanced magnetic filter multi-arc ion coating equipment, and turn on the vacuum system 2 to evacuate to 6.0×10 -3 Pa, turn on the heating system 6, heat to 350°C and keep it stable until the coating is finished;

[0032] 2. After heating and keeping warm for 30 minutes, turn on the Ar in the gas supply system 3, keep the Ar flow rate at 80ml / min, gradually increase the bias voltage and stabilize it at 1200V, and the duty cycle is 30%. The high-energy ions in the plasma field generated by the bias power supply system 4-3 in the equipment bombard the surface of the workpiece for 50 minutes, so that the surface 12 of the workpiece to be treated is cleaned and activated;

[0033] 3. After the argon ion bombardment, restart the fine pumping system in the vacuum system 2 and adjust the pressure to 6.0...

Embodiment 3

[0036] Embodiment 3: prepare Ti (CN) hard film

[0037] 1. Put the workpiece 12 to be processed into the furnace reaction chamber 1 of the Hall source excited magnetron sputtering enhanced magnetic filter multi-arc ion coating equipment, and turn on the vacuum system 2 to evacuate to 6.0×10 -3 Pa, turn on the heating system 6, heat to 300°C and keep it stable until the coating is finished

[0038] 2. After heating and keeping warm for 30 minutes, turn on the Ar in the gas supply system 3, keep the Ar flow rate at 50ml / min, gradually increase the bias voltage and stabilize it at 1100V, and the duty cycle is 35%. The high-energy ions in the plasma field generated by the bias power supply system 4-3 in the equipment bombard the surface of the workpiece for 40 minutes, so that the surface 12 of the workpiece to be treated is cleaned and activated;

[0039] 3. After the argon ion bombardment, restart the fine pumping system in the vacuum system 2 and adjust the pressure to 6.0×10 ...

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Abstract

The invention discloses a making method of magnetic control sputtering reinforced typed magnetic filter multihead ion composite coater excited by Hall source, which comprises the following steps: extracting into vacuum; heating; exciting ion; plating; improving the connecting strength; obtaining the entire and compact film system for industrial need.

Description

technical field [0001] The invention relates to a method and equipment for depositing a hard film material on the surface of a mold, in particular to a Hall source excited magnetron sputtering enhanced magnetic filter multi-arc ion composite coating method. Background technique [0002] Compared with CVD (Chemical Vapor Deposition) and PCVD (Plasma Assisted Chemical Vapor Deposition), PVD (Physical Vapor Deposition) has low deposition temperature (100-500°C), short processing period (4-8h), thin film It has the advantages of good appearance and quality, and has been widely used in the preparation of high-speed steel cutting tool surface film. PVD includes magnetron sputtering and ion plating. Mattox first proposed ion plating technology in 1963 and obtained a patent in 1967. After that, various ion plating and sputtering coating technologies appeared one after another. The Japanese Vacuum Technology Company (U.L.VAC) was the first to apply PVD technology to the high-speed s...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/02C23C14/54
Inventor 田增瑞徐可为
Owner 西安宇杰表面工程有限公司
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