Light etching positioning self assembling filling method
A filling method and self-assembly technology, applied in optics, opto-mechanical equipment, photosensitive materials for opto-mechanical equipment, etc., can solve the problem of limited pattern area, low efficiency, and difficulty in producing nanostructures by electron beam or ion beam lithography. Arraying and other problems to achieve the effect of reducing structural defects, high efficiency and simple production
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0021] Embodiment 1 is an array-type nano-metal structure with a characteristic size of less than 70 nanometers produced by the method of the present invention.
[0022] (1) Firstly, use Autocad software to design and locate the template of the micro-area, and determine the size, shape and number of arrays of the micro-area. The shape of the designed micro-area is circular, the size is 0.2mm×0.2mm, and the number of arrays is 4×5, and then the mask plate is made according to the designed positioning micro-area template data;
[0023] (2) Select a chrome-plated glass plate as the base material, and spin-coat a layer of AZ3100 resist on its surface at a speed of 6000 rpm / min for 30 seconds;
[0024] (3) Expose and develop the resist using the prepared micro-region mask; according to the depth of the resist, use an exposure amount of 10uJ / cm 2 , Shipley company developer solution MF319, concentration 100%, developing time 40-50s. Obtain the desired micro-domain structure on the...
PUM
Property | Measurement | Unit |
---|---|---|
diameter | aaaaa | aaaaa |
diameter | aaaaa | aaaaa |
size | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com