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Focusing leveling measuring method and device

A technology for focusing, leveling, and measuring systems, applied in the field of optical measurement, to achieve the effects of reducing errors, stabilizing the measurement system, and improving measurement resolution and measurement accuracy

Inactive Publication Date: 2009-09-02
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

So that the whole system can meet the focus and leveling requirements of the current resolution projection lithography machine below 100nm

Method used

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  • Focusing leveling measuring method and device
  • Focusing leveling measuring method and device
  • Focusing leveling measuring method and device

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Experimental program
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Embodiment Construction

[0043] Further illustrate the present invention below in conjunction with accompanying drawing.

[0044] Such as image 3 As shown, it is a structural schematic diagram of the focusing and leveling system of the lithography machine of the present invention. The following are combined in order image 3 Each component module of the optical system of the present invention is described one by one. The light source collimation module 301 emits highly stable collimated laser light, which becomes linearly polarized light through the polarization beam splitter 302 , passes through the λ / 4 wave plate 305 , passes through the first plane mirror 310 , and is incident on the surface of the tested silicon wafer 311 . The light is reflected from the surface of the tested silicon wafer 311 and the second plane mirror 312 to the semi-transparent and semi-reflective beam splitter 313 . The transflective beam splitter 313 splits the light into two parts (reflected light and transmitted light...

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Abstract

The invention discloses a focusing and leveling measurement method and device, relates to a new method for a focusing and leveling sensing system applied to a wafer in a projection lithography system, and belongs to the field of optical measurement. The invention includes three parts: a light source collimation module, a focusing subsystem and a leveling subsystem. The laser emitted by the laser of the present invention is collimated by a single-mode fiber, and then passes through a drift compensation device, and is incident on the silicon wafer to be measured through a polarization beam splitter and a λ / 4 wave plate. After passing through the silicon wafer to be tested, the lens group is used to zoom in in front of the position detector to obtain the defocus information on the surface of the silicon wafer. The plane beam splitter is used to return the light along the way, and it is incident on the position-sensitive detector through the lens, so as to obtain the two-dimensional tilt information of the surface of the silicon wafer. The system has high resolution, simple optical path structure, and does not require complex optical design.

Description

technical field [0001] The invention relates to a focusing and leveling detection method and device applied in a projection lithography system, which is used for high-precision detection of the distance between the surface of the exposed silicon wafer and the projection objective lens and the two-dimensional inclination angle of the silicon wafer, belonging to the optical measurement field. Background technique [0002] In the projection lithography system, the silicon wafer focusing and leveling measurement system is used in the lithography machine to measure the height and rotation angle (Z, θ) of the silicon wafer surface relative to the projection objective lens X and θ Y ), and three actuators vertical to the workpiece table form a feedback system to control the vertical position of the silicon wafer in real time to ensure that the current field of the silicon wafer is always within the focal depth range of the projection objective during the exposure process. In the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F9/00G03F7/20
Inventor 匡翠方李艳秋刘丽辉
Owner BEIJING INSTITUTE OF TECHNOLOGYGY
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