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Crystal coating light-emitting diode and producing method thereof

A technology of light-emitting diodes and manufacturing methods, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of light output intensity limitation of light-emitting diodes, reduction of light output intensity of light-emitting diodes, and inability to be effectively used, so as to improve quality and The effect of brightness presentation, improvement of light extraction efficiency, and enhancement of light output intensity

Active Publication Date: 2009-04-29
EPISTAR CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, due to the light emission of the flip-chip LED, when it is output upward, it will be absorbed by the upper substrate, and cannot penetrate the substrate, and then output to the outside of the LED.
Therefore, although the flip-chip LED has advantages in packaging, it actually causes the light output intensity of the flip-chip LED to decrease.
[0006] In addition, because the improvement of the brightness of the LED is always the main development trend of the LED technology at present, but generally except for the part where the LED emits light directly upward, the light emitted from other directions will be partially absorbed by the material below the LED. However, it cannot be effectively used as a source of light output, especially the light emitting diode of the flip-chip type. The part emitted to the bottom of the light emitting diode is extremely easy to be blocked by electrodes or scattered.
Therefore, the light output intensity of the light-emitting diode mainly depends on the light-emitting characteristics of the light-emitting diode itself, so that the improvement of the light output intensity of the light-emitting diode is limited.

Method used

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  • Crystal coating light-emitting diode and producing method thereof
  • Crystal coating light-emitting diode and producing method thereof
  • Crystal coating light-emitting diode and producing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0023] A flip-chip light-emitting diode disclosed in the present invention, Figure 1A to Figure 1D It is a schematic cross-sectional flow diagram of a fabrication method of a flip-chip light emitting diode according to an embodiment of the present invention.

[0024] exist Figure 1A In this method, firstly, a light-emitting diode epitaxy structure 101 is fabricated on a substrate 100. The light-emitting diode epitaxy structure 101 mentioned here includes aluminum gallium indium phosphide light-emitting diodes (AlGaInP) and aluminum gallium indium nitride light-emitting diodes (AlGaInN) , wherein, in order to obtain an epitaxial structure with good crystal quality, when making an aluminum gallium indium phosphide (AlGaInP) light-emitting diode, the substrate 100 is selected such as germanium (Ge), gallium arsenide (GaAs) or indium phosphorus (InP) , and when making aluminum gallium indium nitride (AlGaInN) light-emitting diodes, the substrate 100 is selected such as sapphire...

Embodiment 2

[0034] refer to figure 2 Shown is a schematic diagram of another flip-chip light emitting diode 20 according to a preferred embodiment of the present invention. In this embodiment, in addition to the steps mentioned in Embodiment 1, the upper surface of the transparent substrate 210 can be further roughened to form uneven surface characteristics and increase the probability of the light emitting diode outputting light to the outside. The increase will further help to improve the light extraction efficiency of the light emitting diode and the overall light output intensity of the light emitting diode.

[0035] Furthermore, an uneven bonding surface is formed at the interface between the transparent substrate 210 and the soft transparent adhesive layer 208 and the lower surface of the transparent substrate 210 , so that it has an uneven rough surface characteristic.

[0036] The roughening treatment of the upper and lower surfaces of the transparent substrate 210, for example,...

Embodiment 3

[0038] The present invention further discloses a flip-chip light emitting diode, such as Figure 3D as shown, Figure 3A-3D It is a schematic cross-sectional flow diagram of a fabrication method of a flip-chip light emitting diode according to a preferred embodiment of the present invention.

[0039] According to the steps described in Embodiment 1, an n-type semiconductor layer 302, a light-emitting active layer 304, and a p-type semiconductor layer 306 are sequentially formed on the substrate 300 to produce a light-emitting diode epitaxial structure 301, such as Figure 3A shown. Likewise, the light-emitting active layer 304 can be a homostructure, a single heterostructure, a double heterostructure or a multiple quantum well structure.

[0040] Then, attach a temporary base material 310 coated with a soft transparent adhesive layer 308 on the light-emitting diode epitaxial structure 301, and use the adhesive properties of the soft transparent adhesive layer 308 to attach t...

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Abstract

A method for preparing luminous diode of polycrystalline type includes using soft transparent binding layer to stick transparent base material with luminous diode polycrystalline structure on base material, then removing off base material to transfer luminous diode polycrystalline structure on transparent base material, platform - etching said structure to let said structure form on the first and the second top surfaces and simultaneously to expose n type and p type of semiconductor layers, forming metal reflecting and blocking layer on said structure and preparing electrode on blocking layer.

Description

technical field [0001] The invention relates to a flip-chip light-emitting diode and a manufacturing method thereof, in particular to a flip-chip light-emitting diode capable of increasing light output intensity and a manufacturing method thereof. Background technique [0002] Light Emitting Diodes (LEDs) are widely used in lighting sources and display technologies due to their advantages of low production cost, simple structure, low power consumption, small size and easy installation. [0003] Generally, the traditional light-emitting diode is to directly fabricate the epitaxial structure of the light-emitting diode on the substrate, and the cathode electrode and the anode electrode are respectively fabricated on the side of the epitaxial structure of the light-emitting diode and the substrate side. Although such a structure has better The effect of current distribution, but it will lead to an increase in the packaging area of ​​the light emitting diode. Therefore, flip ch...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/00
Inventor 蔡宗良张智松陈泽澎
Owner EPISTAR CORP
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