Crystal coating light-emitting diode and producing method thereof
A technology of light-emitting diodes and manufacturing methods, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of light output intensity limitation of light-emitting diodes, reduction of light output intensity of light-emitting diodes, and inability to be effectively used, so as to improve quality and The effect of brightness presentation, improvement of light extraction efficiency, and enhancement of light output intensity
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Embodiment 1
[0023] A flip-chip light-emitting diode disclosed in the present invention, Figure 1A to Figure 1D It is a schematic cross-sectional flow diagram of a fabrication method of a flip-chip light emitting diode according to an embodiment of the present invention.
[0024] exist Figure 1A In this method, firstly, a light-emitting diode epitaxy structure 101 is fabricated on a substrate 100. The light-emitting diode epitaxy structure 101 mentioned here includes aluminum gallium indium phosphide light-emitting diodes (AlGaInP) and aluminum gallium indium nitride light-emitting diodes (AlGaInN) , wherein, in order to obtain an epitaxial structure with good crystal quality, when making an aluminum gallium indium phosphide (AlGaInP) light-emitting diode, the substrate 100 is selected such as germanium (Ge), gallium arsenide (GaAs) or indium phosphorus (InP) , and when making aluminum gallium indium nitride (AlGaInN) light-emitting diodes, the substrate 100 is selected such as sapphire...
Embodiment 2
[0034] refer to figure 2 Shown is a schematic diagram of another flip-chip light emitting diode 20 according to a preferred embodiment of the present invention. In this embodiment, in addition to the steps mentioned in Embodiment 1, the upper surface of the transparent substrate 210 can be further roughened to form uneven surface characteristics and increase the probability of the light emitting diode outputting light to the outside. The increase will further help to improve the light extraction efficiency of the light emitting diode and the overall light output intensity of the light emitting diode.
[0035] Furthermore, an uneven bonding surface is formed at the interface between the transparent substrate 210 and the soft transparent adhesive layer 208 and the lower surface of the transparent substrate 210 , so that it has an uneven rough surface characteristic.
[0036] The roughening treatment of the upper and lower surfaces of the transparent substrate 210, for example,...
Embodiment 3
[0038] The present invention further discloses a flip-chip light emitting diode, such as Figure 3D as shown, Figure 3A-3D It is a schematic cross-sectional flow diagram of a fabrication method of a flip-chip light emitting diode according to a preferred embodiment of the present invention.
[0039] According to the steps described in Embodiment 1, an n-type semiconductor layer 302, a light-emitting active layer 304, and a p-type semiconductor layer 306 are sequentially formed on the substrate 300 to produce a light-emitting diode epitaxial structure 301, such as Figure 3A shown. Likewise, the light-emitting active layer 304 can be a homostructure, a single heterostructure, a double heterostructure or a multiple quantum well structure.
[0040] Then, attach a temporary base material 310 coated with a soft transparent adhesive layer 308 on the light-emitting diode epitaxial structure 301, and use the adhesive properties of the soft transparent adhesive layer 308 to attach t...
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