Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Hard nanometer layered ZrO2/TiN coating

A nano-multilayer and coating technology is applied to the surface of cutting tool materials with ceramic coating, ceramic coating, which can solve the problem that the shear modulus difference is not large enough, fails to meet the necessary conditions of nano-multilayer and coating, Can not form superhard effect coherent interface and other problems, to achieve the effect of large application value and excellent high temperature oxidation resistance

Inactive Publication Date: 2008-12-17
SHANGHAI JIAOTONG UNIV
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Among them, ZrO 2 / Al 2 o 3 Thanks Al 2 o 3 The amorphous state of the multilayer coating cannot form the coherent interface necessary for the superhard effect, and the ZrO 2 / Y 2 o 3 Although the nano-multilayer coating forms a coherent interface, the difference in shear modulus between the two compositions is not large enough and fails to meet the necessary conditions for the nano-multilayer and coating to produce superhard effects

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Hard nanometer layered ZrO2/TiN coating

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0017] The present invention ZrO 2 The specific process parameters of the preparation method of the / TiN multilayer coating are: the partial pressure of Ar gas is 3.2×10 -1 Pa, ZrO 2 The sputtering power of the target is 150W, the deposition time is 9 seconds, the power of the TiN target is 50W, the deposition time is 1 second, the total sputtering time is 2h, and the substrate temperature is 2 / ZrO in TiN multilayer coating 2 The layer thickness is 4.4 nm, the TiN layer thickness is 0.4 nm, and the total thickness is 2 μm. The hardness of the coating was 19.6 GPa.

example 2

[0019] The present invention ZrO 2 The specific process parameters of the preparation method of the / TiN multilayer coating are: the partial pressure of Ar gas is 3.2×10 -1 Pa, ZrO 2 The sputtering power of the target is 150W, the deposition time is 9 seconds, the power of the TiN target is 50W, the deposition time is 2 seconds, the total sputtering time is 2h, and the substrate temperature is 2 / ZrO in TiN multilayer coating 2 The layer thickness is 4.4 nm, the TiN layer thickness is 0.8 nm, and the total thickness is 2 μm. The hardness of the coating was 23 GPa.

example 3

[0021] The present invention ZrO 2 The specific process parameters of the preparation method of the / TiN multilayer coating are: the partial pressure of Ar gas is 3.2×10 -1 Pa, ZrO 2 The sputtering power of the target is 150W, the deposition time is 9 seconds, the power of the TiN target is 50W, the deposition time is 1 second, the total sputtering time is 3.5h, and the substrate temperature is 2 The thickness of the ZrO2 layer in the / TiN multilayer coating is 4.4nm, the thickness of the TiN layer is 1.2nm, and the total thickness is 3.5μm. The hardness of the coating was 21 GPa.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
hardnessaaaaaaaaaa
Login to View More

Abstract

The present invention is one kind of multilayer hard nanometer ZrO2 / TiN coating and belongs to the field of ceramic coating technology. The multilayer hard nanometer ZrO2 / TiN coating includes alternately deposited ZrO2 layers of 2-8 nm thickness and TiN layers of 0.4-1.2 nm thickness on the substrate of hard alloy, ceramic or metal, and has total thickness of 2-5 microns. It is prepared through a double-target sputtering process in argon atmosphere. It has not only excellent high temperature oxidation resistance, but also hardness as high as 19.1-23 GPa. The multilayer hard nanometer ZrO2 / TiN coating of the present invention may be formed on high speed cutting tool and other high temperature wear and corrosion resistant workpieces.

Description

technical field [0001] What the present invention relates to is a kind of ceramic coating, specifically a kind of ZrO 2 / TiN hard nano multi-layer coating, used in the technical field of ceramic coating on the surface of cutting tool materials. Background technique [0002] Due to the high machining efficiency and low environmental pollution, high-speed dry cutting with a cutting speed of ≥100m / min is increasingly becoming the mainstream of cutting technology development. At the same time, high-speed and dry cutting technology put forward higher requirements on the performance of tool coatings. In addition to requiring the coating to have mechanical properties such as high hardness and low friction coefficient that ordinary cutting tool coatings should have, it is also necessary to coat The layer has excellent high temperature oxidation resistance. However, although the existing tool coatings have high hardness, their oxidation resistance cannot meet the harsh service cond...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/35
Inventor 李戈扬刘艳岳建岭孔明戴嘉维
Owner SHANGHAI JIAOTONG UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com