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Nanometer layered VN/SiO2 coating and its prepn

A nano-multi-layer, multi-layer coating technology, applied in the coating, metal material coating process, ion implantation plating and other directions, can solve the problem that the nano-multi-layer coating cannot be industrially produced and the nano-multi-layer coating is difficult to industrialize. Production, long time required, etc., to achieve the effect of large application value, excellent mechanical properties, and high hardness mechanical properties

Inactive Publication Date: 2007-01-03
SHANGHAI JIAO TONG UNIV
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Problems solved by technology

However, the TiN / SiO proposed in this patent 2 Nanoscale multilayer coatings were prepared by direct sputtering of TiN and SiO in an Ar atmosphere 2 The ceramic target is obtained, because the deposition efficiency of the ceramic target is much lower than that of the metal target through the reaction gas (such as N 2 Gas) for the efficiency of reactive sputtering deposition coating, the nano-multilayer coating is also difficult to apply to industrial production
In addition, for nano-multilayer coatings composed of nitrides and oxides, although dual gas sources (that is, two reactive gases N 2 and O 2 ) method, through the continuous switching of two reactive gases to obtain nitrides and oxides respectively by reactive sputtering, but because the gas switching takes a long time, this method cannot be used in the industrial production of nano-multilayer coatings

Method used

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  • Nanometer layered VN/SiO2 coating and its prepn

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preparation example Construction

[0019] VN / SiO2 2 The preparation process of nanometer multi-layer coating is as follows:

[0020] 1. The surface of the metal or ceramic substrate is mirror-polished, and then the VN layer and SiO are alternately deposited on the metal or ceramic substrate by double-target RF sputtering 2 layer, prepared VN / SiO 2 Nano multilayer coatings, in which the VN layer consists of metal V targets and N 2 obtained by reactive sputtering, while SiO 2 layer is made of SiO 2 Preparation of ceramic targets by direct sputtering.

[0021] 2. The double-target RF sputtering, its V target and SiO 2 The targets are controlled by independent RF cathodes.

[0022] 3. The background vacuum in the vacuum chamber is less than or equal to 10 -3 After Pa, pass Ar, N into it 2 Mixed gas, where Ar gas partial pressure is 0.2-0.8Pa, N 2 The gas partial pressure is 0.07-0.09Pa;

[0023] 4. Turn the substrate holder so that the substrate is respectively on the V target and SiO 2 The target accept...

example 1

[0026] The present invention VN / SiO 2 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.2Pa, N 2 The gas partial pressure is 0.07Pa, the V target sputtering power is 200W, the deposition time is 15 seconds, SiO 2 The target sputtering power is 80W, the deposition time is 5 seconds, and the substrate temperature is 2 The thickness of the VN layer in the multilayer coating is 3.6 nm, SiO 2 The layer thickness is 0.7 nm, and the hardness of the coating is 32 GPa.

example 2

[0028] The present invention VN / SiO 2 The concrete process parameter of the preparation method of multi-layer coating is: Ar gas partial pressure is 0.2Pa, N 2 The gas partial pressure is 0.07Pa, the V target sputtering power is 200W, the deposition time is 15 seconds, SiO 2 The target sputtering power is 80W, the deposition time is 6 seconds, and the substrate temperature is 2 The thickness of the VN layer in the multilayer coating is 3.6 nm, SiO 2 The layer thickness is 0.9 nm, and the hardness of the coating is 34 GPa.

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Abstract

The present invention is one kind of multilayer nanometer VN / SiO2 coating and belongs to the field of ceramic coating technology. The multilayer nanometer VN / SiO2 coating includes alternately deposited VN layers of 2-10 nm thickness and SiO2 layers of 0.3-1.2 nm thickness on the substrate of hard alloy, ceramic or metal, and has total thickness of 2-5 microns. It is prepared through the first mirror polishing of metal or ceramic substrate, the subsequent double-target RF reaction sputtering process to prepare alternately deposited VN layers and SiO2 layers. It has not only excellent high temperature oxidation resistance, but also hardness as high as 30 GPa. The multilayer nanometer VN / SiO2 coating of the present invention may be formed on high speed cutting tool and other high temperature wear resistant workpieces.

Description

technical field [0001] What the present invention relates to is a kind of coating and preparation method thereof, especially a kind of VN / SiO 2 The nanometer multilayer coating and its preparation method are used in the technical field of ceramic coating. Background technique [0002] High-speed cutting and dry cutting with a cutting speed of ≥100m / min are increasingly becoming the mainstream of cutting technology development due to their high machining efficiency and less environmental pollution. This processing technology puts forward higher requirements for the performance of tool coatings. Not only is it required that the tool coating has a high hardness and a small friction coefficient, but it also needs to have a high oxidation resistance. Existing tool coatings do not fully meet these requirements. For example, the hardness of TiN coating is HV25±2GPa, and the oxidation temperature is about 500°C; the hardness of TiCN coating is as high as HV40, but the oxidation re...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/34C23C14/54
Inventor 岳建岭李戈扬赵文济戴嘉维
Owner SHANGHAI JIAO TONG UNIV
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