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Process for preparing patterning titanium dioxide inverse opal photonic crystal

A technology of titanium dioxide and photonic crystals, applied in the direction of titanium dioxide, chemical instruments and methods, titanium oxide/hydroxide, etc., can solve the problems of light leakage, not reflecting the characteristics of photonic crystals, and not having a photonic band gap, etc., to achieve simple process Effect

Inactive Publication Date: 2006-12-20
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, opal photonic crystals do not have a complete photonic band gap, so there is a problem of light leakage, which makes opal not reflect the characteristics that photonic crystals should have

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0008] Embodiment 1: at room temperature, with quartz glass as the substrate, it is vertically immersed in a monodisperse silicon dioxide absolute ethanol solution with a particle size of 200 nanometers and a concentration of 2.5 wt%. opal film composed of balls, and then heat-treat the film at 800°C for 1 hour to enhance its mechanical strength; dissolve butyl titanate and chemical modifier acetylacetone in ethanol, add water diluted with ethanol while stirring evenly, and mix After uniformity, adjust the pH value of the solution to 3 with nitric acid, and prepare a uniform and transparent ultraviolet photosensitive titanium dioxide sol; the ultraviolet photosensitive titanium dioxide sol contains 0.5mol / L of butyl titanate, 1.2mol / L of acetylacetone, and 2.3mol / L of water. The balance of L is ethanol; immerse the heat-treated opal film into the titanium dioxide ultraviolet photosensitive sol, and through capillary action, the ultraviolet photosensitive titanium dioxide sol is...

Embodiment 2

[0009] Embodiment 2: At room temperature, silicon single crystal is used as a substrate, and it is vertically immersed in a monodisperse silicon dioxide absolute ethanol solution with a particle size of 400 nanometers and a concentration of 1.2 wt%, and a vertical deposition method is used to obtain silicon dioxide. Opal film composed of small balls, and then heat-treat the film at 500°C for 3 hours to enhance its mechanical strength; dissolve butyl titanate and chemical modifier acetylacetone in ethanol, add water diluted with ethanol while stirring evenly, After mixing evenly, adjust the pH value of the solution to 4 with nitric acid to prepare a uniform and transparent UV-sensitive titanium dioxide sol; the UV-sensitive titanium dioxide sol contains 0.7 mol / L of butyl titanate, 0.9 mol / L of acetylacetone, and 1.8 mol of water The balance in / L is ethanol; immerse the heat-treated opal film into the titanium dioxide ultraviolet photosensitive sol, and through capillary action...

Embodiment 3

[0010] Embodiment 3: at room temperature, with quartz glass as the substrate, it is vertically immersed in a monodisperse silicon dioxide absolute ethanol solution with a particle size of 300 nanometers and a concentration of 0.5 wt%. opal film composed of balls, and then heat-treat the film at 600°C for 1.5 hours to enhance its mechanical strength; dissolve butyl titanate and chemical modifier acetylacetone in ethanol, add water diluted with ethanol while stirring evenly, and mix After uniformity, adjust the pH value of the solution to 5 with nitric acid, and prepare a uniform and transparent ultraviolet photosensitive titanium dioxide sol; the ultraviolet photosensitive titanium dioxide sol contains 0.6 mol / L of butyl titanate, 0.75 mol / L of acetylacetone, and 2.0 mol / L of water. The balance of L is ethanol; immerse the heat-treated opal film into the titanium dioxide ultraviolet photosensitive sol, and through capillary action, the ultraviolet photosensitive titanium dioxide...

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PUM

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Abstract

The invention discloses a preparing method of pattern titanium oxide reverse-gelite photon crystal, which comprises the following steps: adopting quartz glass or silicon monocrystal as substrate; immersing single-dispersed silica globule solution; adopting vertical depositing method on the substrate to produce gelite film; immersing the heat gelite at 500-800 deg.c in the allocated ultraviolet photosensitive titanium oxide colossal; filling ultraviolet photosensitive titanium oxide colossal in the silica globule gap through capillary action; etching mask ultraviolet light after gelatinizing; cleaning gel part of non-illumination through organic solvent; proceeding heat disposal under 800-1000 deg.c; placing film in the 1-10 percent fluohydric acid solution to dissolve silica globule; drying under 100-150 deg.c to obtain the product.

Description

technical field [0001] The invention relates to a method for preparing a patterned titanium dioxide inverse opal photonic crystal. Background technique [0002] In recent years, the study of photonic crystals has attracted more and more researchers' interest. Photonic crystals are artificial microstructures that are arranged in a certain spatial order by materials with different dielectric constants (refractive indices). As an "optical semiconductor", photonic crystals have a unique function of adjusting the state of light propagation, and have very broad application prospects in the fields of optoelectronic integration, photon integration, and optical communication. [0003] Opal is a colloidal crystal with a face-centered close-packed structure composed of monodisperse silica spheres or polystyrene spheres. Since the particle size of the spheres is on the order of submicrons, opal has become a popular choice for the preparation of visible light and near-infrared bands. A...

Claims

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Application Information

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IPC IPC(8): C30B5/00C30B29/16C01G23/047
Inventor 王秀峰方俊
Owner SHAANXI UNIV OF SCI & TECH
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