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Ultraviolet ray solidification cation type etching glue for nano embessing

A nano-imprinting, cationic technology, applied in the field of etchant, can solve the problems of bubble curing strength, poor reproduction accuracy, insufficient extrusion, etc., to achieve good film formation stability, ensure etching accuracy, Guarantee the effect of imprinting and replicating accuracy and efficiency

Inactive Publication Date: 2006-01-11
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a UV-curable cationic etchant for nanoimprinting, which solves the problem that in the nanoimprint manufacturing process, the traditional etchant tends to generate bubbles or reduce the curing strength, thereby reducing the precision of the replica. Problems with poor or insufficient extrusion into the fine feature cavities of the mold

Method used

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  • Ultraviolet ray solidification cation type etching glue for nano embessing
  • Ultraviolet ray solidification cation type etching glue for nano embessing

Examples

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Embodiment 1

[0043] First choose the mixture of diaryliodonium phosphate and triarylsulfonium hexafluoroantimonate as photoinitiator, the weight of photoinitiator is 3% of total etching glue weight, wherein diaryliodonium phosphate accounts for 70% of photoinitiator, triarylsulfonium hexafluoroantimonate accounts for 30% of photoinitiator, gets the triethylene glycol divinyl ether of gross weight 15%, photoinitiator diaryliodonium phosphate is in Dissolve in triethylene glycol divinyl ether at 50°C, add triarylsulfonium hexafluoroantimonate after cooling to room temperature and stir to form a homogeneous solution A; Cyclohexanoic acid-3', 4'-epoxycyclohexyl methyl ester, 15% linear polydimethylsiloxane, 10% polycaprolactone diol were added to the device and stirred at high speed, and stirred and mixed for 2 hours After forming a uniform liquid B, then add solution A, and then mix and stir for 2 hours to obtain a uniform liquid C, then add a total weight ratio of 0.4% organic alcohol defoam...

Embodiment 2

[0045] Firstly, the mixture of 1% diaryliodonium phosphate and 1% triarylsulfonium hexafluoroarsenate is selected as the photoinitiator in the total weight ratio, and the photoinitiator diaryliodonium phosphate is heated at 50° C. Dissolve with 1,4-cyclohexyldimethanol divinyl ether, the amount of 1,4-cyclohexyldimethanol divinyl ether is 10% of the total weight ratio, after dissolving, cool to room temperature and add triarylsulfonium hexafluoroarsenic Acid acid was stirred to form a homogeneous solution A; the total weight ratio was respectively 40% of 3,4-epoxycyclohexyl carboxylic acid-3', 4'-epoxycyclohexyl methyl ester and 20% of bis-(3 , the mixture of 4-epoxycyclohexyl)-adipate and 20% polycaprolactone trihydric alcohol were added to the device and stirred at a high speed, and after stirring and mixing for 2 hours, a uniform liquid B was formed, and then solution A was added, and mixed again Stir for 2 hours to obtain a uniform liquid C, then add polyether alkyl co-mod...

Embodiment 3

[0047] First select the mixture of 0.2% diaryl iodonium phosphate and 0.8% triaryl sulfonium hexafluoroantimonate as the photoinitiator in the total weight ratio, and make the diaryl iodonium phosphate photoinitiator at 50°C Dissolve with the mixed solution of glycerol carbonate propenyl ether and dodecyl vinyl ether, the mixed solution of glycerol carbonate propenyl ether and dodecyl vinyl ether is 40% of the total weight ratio, after dissolving, cool to Stir at room temperature and add triarylsulfonium hexafluoroantimonate to form a homogeneous solution A; 3,4-epoxy-6-methyl-cyclohexylcarboxylic acid-3', 4' with a total weight ratio of 10% -Epoxy-6'-methylcyclohexyl methyl ester and 30% bulk polydimethylsiloxane, 15% 1,2-epoxyhexadecane are placed in the device and stirred at high speed, and mixed After 2 hours, a homogeneous liquid B is formed, then add solution A, and mix and stir for 2 hours to obtain a homogeneous liquid C, then add an auxiliary agent with a total weight...

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Abstract

The present invention discloses an UV photocuring cationic etchant for nano press-printing process. Its composition includes 10%-60% of fatty epoxide resin, 0%-30% of organic silicone epoxy resin, 10%-40% of vinyl ether, 0%-20% of polycaprolactone polyalcohol, 0%-15% of long-chain fatty epoxide resin, 1%-10% of photo-initiator and 0%-8% of adjuvant. The photo-initiator is one or more than one compounds selected from diaryl iodine onium phosphate, triaryl sulphur onium hexafluoroantimonate or triaryl sulphur onium hexafluoroarsenate, and the adjuvant includes organic silane coupling agent, organic silane flow agent and organic alcohols or polyether alkyl comodified silicone oil defoaming agent.

Description

technical field [0001] The invention relates to an etching glue, in particular to an ultraviolet light curing cationic etching glue used in the manufacture of nano imprinting. Background technique [0002] In the traditional photolithographic integrated circuit manufacturing process, the shape or inversion of the integrated circuit is formed in the designated area of ​​​​the photoresist by mask exposure method. The photoresist used is positive photoresist or negative photoresist. , in order to facilitate the formation of a certain thickness of the film, the positive or negative photoresist contains volatile solvents, after the film is coated, it is necessary to dry the volatile solvents. However, in the process of manufacturing fine features (including integrated circuits) by nanoimprinting, positive or negative photoresists are completely unsuitable due to their shortcomings such as volatile solvents and large shrinkage. [0003] To manufacture fine features (including int...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/004G03F7/039
Inventor 段玉岗丁玉成李涤尘卢秉恒
Owner XI AN JIAOTONG UNIV
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