Terminal having surface layer , and part and product having the same
A surface layer and terminal technology, applied in the direction of contact parts, thin material processing, contact materials, etc., can solve the problems that the crystallization state and melting point are not specified, the generation of metal whiskers cannot be fully prevented, and solderability cannot be obtained. Achieve thin and uniform thickness
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Embodiment 1
[0099] First, as a conductive substrate, phosphor bronze rolled into a strip-shaped strip with a thickness of 0.3 mm and a width of 30 mm is stamped into the shape of a connector, and the processed intermediate formed in the shape of a continuous connector terminal is cut and grown. After the temperature is 100m, it is taken up with a reel. Then, this reel was set on the delivery shaft of the continuous plating apparatus.
[0100] Next, by continuous immersion in the immersion solution of the above-mentioned continuous plating device filled with an aqueous solution containing sodium hydroxide at a liquid temperature of 48° C. The above-mentioned conductive substrate is subjected to the first washing treatment for one minute. Thereafter, washing with water was performed several times.
[0101] Then, in the electrolytic tank (using 100 g / l of NC Rustol (manufactured by Okuno Pharmaceutical Co., Ltd.) as an aqueous sodium hydroxide solution, pH 13.2) to make the pH of the conti...
Embodiment 2
[0109] In addition to using a plating solution of a Sn-Ag-Cu ternary alloy having another composition (the MetasuAM (manufactured by Yuken Industries) is 110 g / l, Sn is 60 g / l, Ag is 3.4 g / l, Cu is 1.2 g / l, inorganic system chelating agent (the described FCM-A, the FCM company system) 15g / l, the organic system chelating agent (the described FCM-B, the FCM company system) is 10g / l, the additive (the described FCM company system) -C, manufactured by FCM Corporation) was 30 cc / l) instead of the electroplating solution of the Sn-Ag-Cu ternary alloy in Example 1, and the others were the same as in Example 1 to obtain the terminal of the present invention.
[0110] The terminals thus obtained were sampled at points 10m and 90m from one end, and the cross-section was cut using a FIB device to measure the thickness. The thickness of the base layer made of Ni was 1.1μm, and that of The thickness of the surface layer composed of Cu ternary alloy was 3.5 μm. Furthermore, the surface la...
Embodiment 3
[0114] In addition to using a plating solution of a Sn-Ag-Cu ternary alloy having another composition (the MetasuAM (manufactured by Yuken Industries) is 110 g / l, Sn is 60 g / l, Ag is 3.8 g / l, Cu is 1.2 g / l, inorganic system chelating agent (the described FCM-A, the FCM company system) 15g / l, the organic system chelating agent (the described FCM-B, the FCM company system) is 10g / l, the additive (the described FCM company system) -C, manufactured by FCM Corporation) was 30 cc / l) instead of the electroplating solution of the Sn-Ag-Cu ternary alloy in Example 1, and the others were the same as in Example 1 to obtain the terminal of the present invention.
[0115] The terminals thus obtained were sampled at points 10m and 90m from one end, and the cross-section was cut using a FIB device to measure the thickness. The thickness of the base layer made of Ni was 1.1μm, and that of The thickness of the surface layer composed of Cu ternary alloy was 3.5 μm. Furthermore, the surface la...
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