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Image display device and projector

A film structure and thin film technology, which can be used in decorative arts, patterns and instruments characterized by light projection effects, and can solve the problems of unsatisfactory durability of fluoropolymers.

Inactive Publication Date: 2004-03-31
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Nevertheless, the durability of this fluoropolymer is still not satisfactory enough, although it has high transparency to 157nm laser
And due to the reflected or scattered light of the laser, the film attached to the frame has similar degradation problems

Method used

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  • Image display device and projector
  • Image display device and projector
  • Image display device and projector

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0138] Embodiment 1: the preparation of fluoropolymer

[0139] Add 30 grams of 1,1,2,4,4,5-hexafluoro-3-oxa-5-trifluoromethyl-1,6-heptadiene into a 200ml autoclave made of pressure-resistant glass 【CH 2 =CHCF(CF 3 ) CF 2 OCF=CF 2 ] and 80 grams of perfluorohexane, flushed with nitrogen. 17 mg of bis(heptafluorobutyryl) peroxide was also added as a polymerization initiator. The interior of the experimental apparatus was again flushed with nitrogen. Polymerization was carried out in this vessel at 0°C for 72 hours. As a result of the reaction, 24 g of a fluorine-containing polymer having an alicyclic structure in the main chain (hereinafter referred to as polymer (A-1)) was obtained.

[0140] When the temperature is 30°C, the intrinsic viscosity [η] of the polymer (A-1) in perfluorinated (2-butyltetrahydrofuran) is 0.6dl / g, and the glass transition temperature of the polymer (A-1) is 108 ℃. At room temperature, it is a tough, transparent glassy polymer with a refractive...

Embodiment 2

[0141] Embodiment 2: Preparation of fluoropolymer

[0142] Add 20 g of 1,1,2,4,4,5-hexafluoro-3-oxa-5-trifluoromethyl-1,6-heptadiene into a 100 ml autoclave made of pressure-resistant glass , 7.5 g of perfluoro(2,2-dimethyl-1,3-dioxol) and 80 g of 1H perfluoroethane, flushed with nitrogen. 23 mg of bis(heptafluorobutyryl) peroxide was also added as a polymerization initiator. The interior of the experimental apparatus was again flushed with nitrogen. Polymerization was carried out in this vessel at 10°C for 72 hours. As a result of the reaction, 15 g of a fluorine-containing polymer having an alicyclic structure in the main chain (hereinafter referred to as polymer (A-2)) was obtained.

[0143] The intrinsic viscosity [η] of the polymer (A-2) in perfluorinated (2-butyltetrahydrofuran) was 0.62 dl / g at a temperature of 30°C. At room temperature, it is a tough, transparent glassy polymer. After measuring the 1H-NMR spectrum of the polymer (A-2), it was found that no obvious...

Embodiment 3

[0144] Embodiment 3: Preparation of fluoropolymer

[0145] Add 24 grams of 1,1,2,4,4,5-hexafluoro-3-oxa-5-trifluoromethyl-1,6-heptane in a 200ml autoclave made of pressure-resistant glass alkene. Then add a mixture of 29 grams of bis(heptafluorobutyryl) peroxy compound and 70 grams of 1H-perfluoroethane, as the initiator of the polymerization reaction, the inside of the device is flushed with nitrogen, and then 4.6 grams of vinylidene fluoride is added into the gas phase. Next, the polymerization reaction was carried out at 10° C. for 72 hours. As a result, a fluorine-containing compound having an alicyclic structure in the main chain (hereinafter referred to as polymer (A-3)) was obtained.

[0146] The intrinsic viscosity [η] of the polymer (A-3) in perfluorinated (2-butyltetrahydrofuran) at a temperature of 30°C was 0.36 dl / g. At room temperature, it is a tough, transparent glassy polymer. It can be seen from the measurement results of its 1H-NMR spectrum that weak sign...

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Abstract

A pellicle is used for a photolithographic patterning process using a light having a wavelength of from 100 to 200 nm. The pellicle contains a pellicle membrane containing (A) a substantially linear fluoropolymer which has an alicyclic structure in its main chain, the main chain being a chain of carbon atoms, and the fluropolymer satisfying the following requirements (1) the carbon atoms in the main chain of the fluoropolymer contain a carbon atom having at least one hydrogen atom bonded thereto and a carbon atom having no hydrogen atom bonded thereto; and (2) in the measurement of a high resolution proton magnetic resonance spectrum of the fluoropolymer, a number of hydrogen atoms based on signals appearing on the higher magnetic field side higher than 2.8 ppm, is at most 6 mol % based on a total number of hydrogen atoms.

Description

technical field [0001] The present invention relates to film structures used in photolithography using light with a wavelength of 100-200 nm. technical background [0002] The film structure is applied in the photolithography step in the production of semiconductor devices and liquid crystal display panels, and it is a complete dust-proof device installed on the photolithography mask and shrink reticle (hereinafter referred to as the mask) to prevent the accumulation of dust particles On the mask, preventing sample failure during exposure. Usually, it has a structure, which is a transparent film adhered to a frame by an adhesive, which is mounted on the mask surface at a certain distance from the mask surface. [0003] This film structure is used in the production fields of semiconductor devices and liquid crystal display panels. The wavelength of the light source used in photolithography is rapidly shortening as the wiring and the pitch between the wirings shrink. In the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B3/02B32B27/00B44F1/00G02B1/04G02F1/13G03F1/62H01L21/027
CPCG03F1/62Y10T428/161Y10T428/3154
Inventor 松仓郁生代田直子对马奈奈山本清柿田玲子
Owner ASAHI GLASS CO LTD
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