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Applying method and device for thermal developing sensitive material

A photosensitive material and coating device technology, which is applied in the application of photosensitive materials, photosensitive materials, photosensitive material substrates/auxiliary layers, etc., can solve problems such as stripes and spots, and uneven film thickness of the coating layer

Inactive Publication Date: 2002-04-03
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

When coating the photosensitive layer and the protective layer on the substrate, the disadvantage is that the film thickness of the coating layer coated on the substrate is prone to unevenness, streaks and spot

Method used

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  • Applying method and device for thermal developing sensitive material
  • Applying method and device for thermal developing sensitive material
  • Applying method and device for thermal developing sensitive material

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Embodiment Construction

[0018] Hereinafter, the preferred embodiments of the thermally developable photosensitive material coating method and apparatus of the present invention will be described in detail with reference to the accompanying drawings.

[0019] figure 1 A partial cross-sectional view showing the thermally developable photosensitive material coating apparatus 10 of the present invention using the slide 14 . As a thermally developable photosensitive material, it is structurally provided with at least one photosensitive layer containing at least one organic acid silver and at least one hydrophobic polymer latex used as a binder on the substrate 12, and on the side of the photosensitive layer opposite to the aforementioned substrate One or more non-developing recordable protective layers with at least one water-soluble polymer as a binder on the opposite side, in this embodiment, to form a photosensitive layer, an intermediate layer and a protective layer, three layers are simultaneously co...

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Abstract

The invention provides a coating method and device for a high-quality heat-developing photosensitive material capable of effectively forming a photosensitive layer and a protective layer without defects such as uneven film thickness, streaks, and spots. While supplying the coating liquid from one end of the manifold (22) to the other end, the pressure loss flowing to the opening (30) is reduced from one end to the other end, thereby offsetting the pressure loss flowing to the manifold (22) The resulting hydraulic pressure is reduced. In the device, the length from the manifold 22 of the opening (30) to the sliding surface (28) is made shorter from one end to the other. Therefore, the flow rate of the coating liquid extruded from the width direction of the opening (30) (equivalent to the coating width direction) onto the sliding surface (28) can be uniform, and a good coating layer without coating defects can be obtained.

Description

technical field [0001] The present invention relates to a coating method and device for thermally developing photosensitive materials. Background technique [0002] In recent years, in the field of medical diagnostic film and photolithographic film, there is a strong desire to reduce the amount of waste liquid to be treated for the purpose of environmental protection and space saving. Therefore, there is a need for thermally developable photosensitive material technology for medical diagnostic films and photolithographic films that can be effectively exposed by a laser image setting device or laser imager and form distinct black images of high resolution and sharpness. The advantage of this thermally-developable photosensitive material is that it can provide users with a more convenient and environmentally friendly thermally-developing processing system that does not require solution-based chemicals. [0003] Thermally developable photosensitive materials are usually struct...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05C5/00B05C9/06B05D1/26B05D7/24G03C1/498G03C1/74G03C1/76
CPCG03C1/74B05C9/06B05C5/007G03C1/49881
Inventor 中嶌贤二
Owner FUJIFILM CORP
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