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Low-power-consumption high-reliability half-packaged trench gate MOSFET device and preparation method thereof

A trench gate, low power consumption technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, climate sustainability, etc., can solve the problems of increased device on-resistance and increase in conduction loss, and achieve on-resistance Reduced, reduced conduction loss, improved short-circuit capability

Active Publication Date: 2022-08-02
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although the traditional half-encapsulated trench gate MOSFET can provide strong protection for the gate dielectric and improve the reliability of the gate dielectric of the device, it sacrifices half of the channel density, which increases the on-resistance of the device and increases the conduction loss.

Method used

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  • Low-power-consumption high-reliability half-packaged trench gate MOSFET device and preparation method thereof
  • Low-power-consumption high-reliability half-packaged trench gate MOSFET device and preparation method thereof
  • Low-power-consumption high-reliability half-packaged trench gate MOSFET device and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0051] like figure 2 As shown, a low power consumption semi-encapsulated trench gate silicon carbide MOSFET device in this embodiment includes: an N-type substrate 12 , an N-type epitaxial layer 11 located above the N-type substrate 12 , and an N-type epitaxial layer 11 located above the N-type substrate 12 . The second P-body region 10 above, the second P+ contact region 8 and the second N+ contact region 9 located inside the second P-body region 10, the second P+ contact region 8 and the second N+ contact region 9 located above and The first source electrode 1 forming ohmic contact with the second P+ contact region 8 and the second N+ contact region 9, the gate dielectric 7 on the left and the gate dielectric 7 on the right above the second P-body region 10, the left gate dielectric 7 A trench gate 2 is arranged inside the gate dielectric 7, a sub-trench gate 3 is arranged inside the gate dielectric 7 on the right, and a first P+ contact region 4 located on both sides of th...

Embodiment 2

[0074] like Figure 16 As shown, the difference between the device structure of this embodiment and Embodiment 1 is that there is a second source electrode 14 separated from the first source electrode 1 above the N-type epitaxial layer 11, and the second source electrode 14 is located at the first P+ contact Above the region 4 , the second source electrode 14 forms a Schottky contact with the N-type substrate 11 . The advantage of this is that a Schottky contact is formed between the second source electrode 14 and the N-type epitaxial layer 11, which provides an SBD diode for the MOSFET, which inhibits the opening of the body diode when the MOSFET device works in the third quadrant, so that the device enters bipolar conduction. On mode, the freewheeling capability of the third quadrant of the device is enhanced and the reliability of the device is improved; when the SBD is reverse biased, the JFET formed between the first P+ contact region 4 and the second P-body region 10 is ...

Embodiment 3

[0076] like Figure 18 As shown, a low power consumption trench gate silicon carbide MOSFET device in this embodiment includes: an N-type substrate 12 , an N-type epitaxial layer 11 located above the N-type substrate 12 , and an N-type epitaxial layer 11 located around the top of the N-type epitaxial layer 11 The second P-body region 10 on both sides, the second P+ contact region 8 and the second N+ contact region 9 located inside the second P-body region 10, and above the second P+ contact region 8 and the second N+ contact region 9 The source electrode 1, a gate dielectric 7 is provided in the middle above the N-type epitaxial layer 11, a trench gate 2 is provided inside the gate dielectric 7 in the middle, and a gate dielectric is provided above the second P-body regions 10 on the left and right sides respectively. 7 and the sub-trench gate 3 inside the gate dielectric 7, a first P+ contact region 4 and a first N+ contact region 5 are arranged between the gate dielectric 7 ...

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Abstract

The invention provides a low-power-consumption high-reliability semi-wrapped trench gate silicon carbide MOSFET device and a preparation method thereof. The low-power-consumption high-reliability semi-wrapped trench gate silicon carbide MOSFET device comprises an N-type substrate, an N-type epitaxial layer, a first P-body region, a first P + contact region, a first N + contact region, a second P-body region, a second P + contact region, a second N + contact region, a gate medium, a trench gate, an auxiliary trench gate, a source electrode and a drain electrode. Compared with a traditional half-wrapped trench gate silicon carbide MOSFET, the gate dielectric is protected by forming the second P-body region at the bottom of the trench, the reliability of the gate dielectric of the device is enhanced, a part of gate-drain capacitance is shielded, the switching loss of the device is reduced on the basis of not sacrificing the conduction capability of the original trench MOSFET, and when the device is short-circuited, the drain voltage is relatively large, so that the reliability of the device is improved. And at the moment, the JFET region between the second P-body region and the first P + contact region is pinched off, so that the saturation current of the device is reduced, and the short-circuit capability of the device is improved.

Description

technical field [0001] The invention belongs to the technical field of power semiconductor devices, in particular to a low power consumption and high reliability half-pack trench gate silicon carbide MOSFET device and a preparation method thereof. Background technique [0002] As one of the representatives of the third generation of wide-bandgap semiconductor materials, silicon carbide (Silicon Carbide) material has a wider band gap (3 times) than silicon material, a higher critical electric field (10 times), a higher load The advantages of the current saturation drift speed (2 times), higher thermal conductivity (2.5 times), etc., are excellent materials for the preparation of high-voltage power electronic devices. application prospects. [0003] MOSFET is one of the most widely used gate-controlled devices in silicon carbide power devices. Since SiC MOSFET is a device characterized by a unipolar transport mechanism, only one of the electrons or holes conducts electricity...

Claims

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Application Information

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IPC IPC(8): H01L29/06H01L29/78H01L21/336
CPCH01L29/7827H01L29/66068H01L29/0684Y02B70/10
Inventor 李轩吴阳阳吴一帆赵汉青邓小川张波
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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