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Graphene/molybdenum disulfide heterojunction semiconductor film and preparation method thereof

A graphene film, molybdenum disulfide technology, applied in the field of chemistry, can solve problems such as immature technology, and achieve the effect of reducing free energy barrier, reducing surface energy, and easy deposition

Pending Publication Date: 2022-06-03
山东云海国创云计算装备产业创新中心有限公司
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0004] At present, the preparation of graphene and molybdenum disulfide thin films has been reported, but there are still relatively few reports on the formation of van der Waals heterojunction between graphene and molybdenum disulfide, and the process is still immature. Continuous research is needed to improve the preparation process. , to obtain large-area, high-quality two-dimensional graphene / molybdenum disulfide heterojunction semiconductor films

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  • Graphene/molybdenum disulfide heterojunction semiconductor film and preparation method thereof
  • Graphene/molybdenum disulfide heterojunction semiconductor film and preparation method thereof

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Embodiment Construction

[0054] In order to make the objectives, technical solutions and advantages of the present invention more clearly understood, the embodiments of the present invention will be further described in detail below with reference to the specific embodiments and the accompanying drawings.

[0055] It should be noted that all expressions using "first" and "second" in the embodiments of the present invention are for the purpose of distinguishing two non-identical entities or non-identical parameters with the same name. " is only for the convenience of expression, and should not be construed as a limitation on the embodiments of the present invention. Furthermore, the terms "comprising" and "having", and any variations thereof, are intended to cover non-exclusive inclusion, for example, other steps or units inherent in a process, method, system, product or apparatus comprising a series of steps or units.

[0056] Based on the above purpose, in the first aspect of the embodiments of the pre...

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Abstract

The invention provides a graphene / molybdenum disulfide heterojunction semiconductor film and a preparation method thereof. The method comprises the following steps: respectively cleaning a copper foil substrate and a silicon dioxide / silicon substrate; growing a graphene film on the processed copper foil substrate; transferring the grown graphene film from the treated copper foil substrate to the treated silicon dioxide / silicon substrate to obtain the silicon dioxide / silicon substrate on which the graphene film is deposited; and growing a molybdenum disulfide thin film on the silicon dioxide / silicon substrate on which the graphene thin film is deposited to obtain the graphene / molybdenum disulfide heterojunction semiconductor thin film. Molybdenum disulfide is generated on a silicon dioxide / silicon substrate on which a graphene film is deposited, so that a large-area continuous high-quality two-dimensional molybdenum disulfide film is obtained, and under the action of Van der Waals force, graphene and molybdenum disulfide naturally form a Van der Waals heterojunction; and the large-area continuous high-quality graphene / molybdenum disulfide heterojunction semiconductor film is obtained.

Description

technical field [0001] The invention relates to the technical field of chemistry, in particular to a graphene / molybdenum disulfide heterojunction semiconductor thin film and a preparation method thereof. Background technique [0002] Two-dimensional materials are an important part of the field of nanomaterials. Two-dimensional materials are a general term for a class of materials, which refer to thin-film materials with a thickness of only one or a few atomic layers. It has always been thought that thin films as thin as atomic size are considered to be thermodynamically unstable, so they cannot exist. It was not until graphene with a single-layer structure was prepared that the existence of two-dimensional materials was proved. The scientific research of dimensional materials has gradually begun to attract widespread attention. At present, methods for preparing two-dimensional materials mainly include chemical vapor deposition, mechanical exfoliation, lithium ion intercalat...

Claims

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Application Information

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IPC IPC(8): C23C16/26C23C16/30C23C16/02C23C16/56C01B32/186C01B32/194
CPCC23C16/26C23C16/305C23C16/0227C23C16/56C01B32/186C01B32/194Y02P70/50
Inventor 张璐
Owner 山东云海国创云计算装备产业创新中心有限公司
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