Preparation method of silica grinding and polishing agent

Abstract

A method for preparing a silica grinding and polishing agent, comprising the steps of preparing abrasive seed crystals, preparing steps of high-purity saturated silica sol solution, preparing steps of abrasive crystal nuclei deposited with loose silica crystal particles, and coating with The preparation steps of the abrasive crystal nucleus mixed emulsion of the silica sol layer. Through these steps, a silicon dioxide grinding and polishing agent with passivated edges and corners, a high-hardness abrasive crystal nucleus with loose silicon dioxide crystal particles on the surface, and a silica sol layer wrapped on the abrasive crystal nucleus can be prepared. The present invention determines the cutting ability of the grinding and polishing agent by selecting abrasive seeds of different specifications and types; it can also obtain different cutting abilities by adjusting the mass percentage concentration of silicon dioxide in the high-purity saturated silica sol solution and controlling its deposition and crystallization conditions and time Silica crystalline particles; and by controlling the conditions and time of rehydration of the silica crystalline particles, silica sol layers of different thicknesses wrapped outside the abrasive crystal nucleus as lubricating and filling substances can be obtained.

Description

technical field [0001] The invention relates to a preparation method of a grinding and polishing agent, in particular to a preparation method of a silicon dioxide grinding and polishing agent, and belongs to the technical field of production and preparation of grinding and polishing materials. Background technique [0002] Grinding and polishing agent, or commonly referred to as grinding and polishing liquid, is another type of "abrasives" different from consolidated abrasives and coated abrasives. Abrasives", grinding and polishing agents can be divided into abrasives and polishing agents, general abrasives are used for rough grinding, polishing agents are used for precision grinding, polishing agents are usually used in the next process of abrasives, and polishing agents are also used in the industry Abrasives are called abrasives or abrasives are called polishing agents. [0003] Due to the different composition and mixing ratio of the dispersant and auxiliary materials,...

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Problems solved by technology

[0012] Although, such as the invention patent "polydisperse large particle size silica sol and its preparation method" (application number: 201610382474.6), the invention patent "a method for preparing silicon controlled silicon sol with particle size" (application number: 201610157738.8), proposed By adding seeds to silica sol to increase the hardness or size of silica sol particles to improve its grinding and polishing efficiency, however, in these methods, the added seeds are usually monodisperse spherical silica with a particle size of 20-30nm Sol seed crystals, because the seed crystal particles themselves are tiny, inevitably have the characteristics of sol, that is, the hydration film layer formed on the surface of the particles is relatively thick, resulting in low hardness of the final grinding and polishing agent, low grinding and polishing efficiency, and poor effect. , the grinding and polishing silica sol provided by the prior art cannot meet the needs of ultrafine grinding and polishing, and has become one of the bottlenecks affecting silica sol as an ultrafine grinding and polishing material

[0013] Although the invention patent application "Production Method of High Hardness Silica Sol for Grinding and Polishing" (application number: 202010837634.8) provides high hardness silica sol for grinding and polishing, which can be obtained by adding abrasive seeds with different particle sizes and shapes. High-hardness silica sol for grinding and polishing with particle size and different grinding crystal morphology can meet the grinding and polishing needs of different devices and materials, and improve the efficiency of grinding and polishing. However, the preparation process is still relatively complicated, and there is still room for improvement. The grinding crystals in its products have many edges and corners, and the grinding and polishing effect is not ideal.

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