Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Functional mask fabric and preparation method thereof

A functional mask technology, applied in textiles, clothing, protective clothing, etc., can solve the problems of inability to achieve recycling, inability to achieve long-lasting and effective filtration, etc., and achieve the effect of improving the quality and safety of protection and high barrier efficiency

Pending Publication Date: 2021-08-24
泉州师范学院(石狮)生态智能织物工程技术研究院 +2
View PDF13 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, the masks on the market still have shortcomings such as inability to achieve long-lasting and effective filtration after long-term wearing, and inability to achieve recycling.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Functional mask fabric and preparation method thereof
  • Functional mask fabric and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A method of preparing a functional mask fabric, comprising the steps of:

[0026] Preparation of surface-layer imitation mushrooms: Using 50D / 48F of PLA filaments as latital weft yarns, the warp yarn density is 500 roots / 10cm, the weft yarn density is 320 roots / 10cm, the total coverage coefficient of the fabric is 54%, and the tissue structure is selected. The fabric blanket is made, washed 40 ° C for the fabric gray cloth, the water washing time is 20 min, the bath ratio is 1: 40, and the water washed after washing, the drying temperature is 50 ° C, the time is 30 min, and the development of the surface layer imitation mushroom fabric , Control gravity 50g / m 2 .

[0027] Preparation of core layer electrostatic spun nanofiber composite film: Electrostatic spinning technology using polypropylene solutions, 50 g / m 2 The surface of the hydrophilic ES hot air cotton having a thickness of 1.6 mm forms a layer of nanofiber microporous membrane. The spinning voltage is 5...

Embodiment 2

[0031] A method of preparing a functional mask fabric, comprising the steps of:

[0032] Preparation of surface-layer imitation shake fabric: Using 50D / 48F PLA filaments as latitude yarns, the warp yarn density is 520 roots / 10cm, the weft yarn density is 340 roots / 10cm, the total coverage coefficient of the fabric is 56%, and the tissue structure is selected. The fabric blanket is made of 35 ° C for 35 ° C, the water washing time is 25 min, and the bath ratio is 1:50, and the water washed, and the drying temperature is 60 ° C, the time is 15 min, and the surface layer imitation mushroom fabric is developed. , Control gravity 53g / m 2 .

[0033] Preparation of core layer electrostatic spun nanofiber composite film: Electrostatic spinning technology using polypropylene nitrile solution, gram weight is 42 g / m 2 The surface of the hydrophilic ES hot air cotton having a thickness of 1.7 mm forms a layer of nanofiber microporous membrane. The spinning voltage is 52kV, the spinn...

Embodiment 3

[0037] A method of preparing a functional mask fabric, comprising the steps of:

[0038] Preparation of the surface-layer imitation shadabad: Using 50D / 48F PLA filament as a weft yarn, the warp yarn density is 540 roots / 10cm, the weft yarn density is 360 roots / 10cm, the total coverage coefficient of the fabric is 58%, and the tissue structure is selected The fabric blanket is made, washed 45 ° C for the fabric gray cloth, the water washing time is 15 min, the bath ratio is 1:30, the water washed after washing, the drying temperature is 55 ° C, the time is 20 min, the time is 20 min, and the surface layer imitation lotus fabric is developed. , Control grade 57g / m 2 .

[0039] Preparation of core electrostatic spun nanofiber composite film: electrospinning technology using polypropylene solution, at 38 g / m 2 The surface of the hydrophilic ES hot air cotton having a thickness of 1.5 mm forms a layer of nanofiber microporous membrane. The spinning voltage is 48kV, the spinni...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Basis weightaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a preparation method of a functional mask fabric, and belongs to the technical field of filter materials. The preparation method of a mask specifically comprises the following steps of 1) preparing a surface layer lotus leaf-like fabric; 2) preparing a core layer electrospun nanofiber composite membrane; 3) preparing an inner skin contact layer fabric; and 4) combining the mask fabrics. The surface layer of the mask adopts a lotus leaf tissue imitating design, and has the functions of stain resistance, easy washing and easy care; the core layer utilizes an electrospun nanofiber microporous membrane technology and has the advantages of high barrier efficiency, durability, effectiveness and the like; the surface layer fabric and the inner layer fabric are sewn, and a zipper is mounted on one side, so that the core layer electrospun nanofiber composite membrane is convenient to replace, and cyclic utilization is realized; and according to the mask fabric, the BFE filtering efficiency reaches 95% or above, the PFE filtering efficiency reaches 95% or above, and the breathing resistance is smaller than 200 Pa.

Description

Technical field [0001] The present invention belongs to the technical field of filter material, and more particularly to a functional mask fabric and a preparation method thereof. Background technique [0002] In today's world, white pollution and microma problems are getting more serious, and all countries around the world have issued relevant laws to prohibit or limit the use of non-degradable plastics. At present, the demand for medical protective supplies such as masks and protective clothing has increased dramatically, but its waste of waste has further exacerbated environmental burden, and therefore, a biodegradable functional mask is urgently needsed. [0003] Polylactic acid fiber (PLA) is a new type of renewable, complete biodegradable polymer new material, which can be broken down into carbon dioxide and water in soil or sea water, and it will not dissipate toxic gas when burning. Will not cause environmental pollution. Therefore, polylactic acid is used as an alternati...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D03D21/00D03D13/00D03D15/283D04H1/728D04H1/43D04H1/4382D04H1/4374A41D13/11A41D31/04
CPCD03D21/00D03D13/008D03D15/00D03D13/00D04H1/728D04H1/43D04H1/4382D04H1/4374A41D13/11A41D31/04D10B2331/041D10B2401/12
Inventor 孙浪涛黄紫亚李楚涵成欣毓杨雪霞张嘉烨李建华张宏杰
Owner 泉州师范学院(石狮)生态智能织物工程技术研究院
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com