Film preparation method for improving application frequency of film
A thin film preparation and thin film technology, which is applied in the field of preparation of increasing the application frequency of NiFe thin films, can solve problems such as low magnetic permeability, and achieve the effect of high magnetic permeability and high application frequency
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Embodiment 1
[0026] A thin film preparation method for increasing the application frequency of the thin film, specifically comprising the following steps:
[0027] Step 1. Turn on the main power supply and the switches of each part of the electron beam evaporation system, turn on the water cooler, mechanical pump, molecular pump, film thickness meter, and electron gun in turn to preheat the equipment;
[0028] Step 2, ultrasonically clean the Si(100) substrate with a size of 5mm×5mm in acetone, ethanol, and deionized water for 15 minutes in sequence, and dry it for later use;
[0029] Step 3. Put the NiFe target into the water-cooled crucible in the vacuum chamber, place the substrate on the sample holder, fix one end of the substrate on the sample holder, and lift the other end so that the substrate and the sample holder are at 5°. A permanent magnet is used to apply a magnetic field with a magnitude of 104Oe and a direction parallel to the edge of the substrate fixed on the sample holder...
Embodiment 2
[0034] Compared with Embodiment 1, this embodiment differs in that: in step 3, the angle between the substrate and the sample holder is 10°. All the other steps are the same as in Example 1.
Embodiment 3
[0036] Compared with Embodiment 1, this embodiment differs in that: in step 3, the angle between the substrate and the sample holder is 15°. All the other steps are the same as in Example 1.
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