A back tube for casting a rotating target and its manufacturing method

Abstract

The invention relates to the technical field of the manufacture of rotating targets, in particular to a back pipe used for casting rotating targets. It includes a stainless steel tube, the outer part of the stainless steel tube is electroplated with a nickel layer, the thickness of the nickel layer is 0.005-0.1 mm, the surface roughness of the nickel layer is Ra3.2-Ra6.3, and the surface of the nickel layer has Tin layer. The production method is as follows: first, the surface of the stainless steel tube is cleaned, then polished, and then electroplated with a nickel layer on its surface, then annealed, then treated with an acid solution, and then treated with a tin infiltration solution. It is cleaned and dried to obtain the back tube for casting the rotating target. The rotating target produced by the back tube of the present invention has less impurities, less shielding effect on the magnetic field, and better sputtering effect.

Description

technical field [0001] The invention relates to the technical field of the manufacture of rotating targets, in particular to a back tube for casting a rotating target and a manufacturing method thereof. Background technique [0002] Compared with the flat target, the rotating target has the advantages of high utilization rate and high sputtering efficiency. The current low melting point rotary targets, such as rotary tin targets, rotary zinc-tin targets, rotary zinc-aluminum targets, and rotary zinc-tin-antimony targets, are generally produced by a casting process. The rotating target material produced by the casting process has the advantages of high density, low oxygen and nitrogen content, good thermal conductivity, etc., and the equipment is simple and the production cost is low. However, tin, zinc tin and other materials have low strength and are easy to deform, so they must be cast on the stainless steel back tube. [0003] The current production principle of rotatin...

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Problems solved by technology

[0004] However, this method has the following problems: 1. It takes a certain period of time for the melt of the target material to fully infiltrate the surface of the nickel-aluminum layer (only after infiltration can the two be combined to achieve alloying, thereby high bonding strength), and The infiltration process of each part is inconsistent. First, some points start to infiltrate, then gradually expand from the point to the surface, and finally the entire outer surface is completely infiltrated, which leads to a long time for most surfaces to infiltrate, and a large amount of nickel and aluminum elements Dissolved into the target material melt, resulting in excessive nickel and aluminum element content in the target, and the final target purity is unqualified; 2. The rotating target is installed on the vacuum magnetron sputtering coating equipment, and the tube inside the back tube A magnetic rod is placed in the cavity, and the magnetic field of the magnetic rod penetrates the stainless steel back tube, the nickel-aluminum layer and the target material to control the charged ions (usually argon ions) outside the target to bombard the target surface, so that the target material is atomized However, the nickel-aluminum layer is a magnetic material, which will form a certain degree of shielding effect on the magnetic bar, thereby weakening the magnetic field outside the rotating target and making the sputtering effect worse

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