Two-dimensional heterojunction tunneling field effect transistor immunosensor and preparation method thereof
A technology of tunneling field effect and immune sensor, which is applied in the field of two-dimensional heterojunction tunneling field effect transistor immune sensor and its preparation, and can solve the problems of short channel effect and sensitivity limitation of devices
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Embodiment 1
[0048] Step 1, providing an insulating substrate and cleaning it, the specific steps are as follows:
[0049] 1) SiO 2 Put the Si substrate in an acetone solution for ultrasonic cleaning, and the cleaning time is 5 minutes. Put the substrate cleaned by acetone into an ethanol solution for ultrasonic cleaning for 5 minutes, and finally rinse it with deionized water for 1 minute to remove the Si substrate. organic material;
[0050] 2) Clean the Si substrate in a mixed solution of hydrochloric acid, hydrogen peroxide, and deionized water at a ratio of 1:1:6 to remove impurities such as active metals, metal oxides, and hydroxides on the Si substrate;
[0051] 3) Clean the Si substrate in a mixed solution of hydrofluoric acid and deionized water at a ratio of 1:50 for 30 seconds, then put it in deionized water and let it stand for 1 minute. Repeat this step 5 times to remove the surface of the Si substrate. natural oxides and dangling bonds;
[0052] 4) Dry the cleaned Si subst...
Embodiment 2
[0075] Step 1, providing an insulating substrate and cleaning it, the specific steps are as follows:
[0076] 1) SiO 2 Put the Si substrate in an acetone solution for ultrasonic cleaning, and the cleaning time is 5 minutes. Put the substrate cleaned by acetone into an ethanol solution for ultrasonic cleaning for 5 minutes, and finally rinse it with deionized water for 1 minute to remove the Si substrate. organic material;
[0077] 2) Clean the Si substrate in a mixed solution of hydrochloric acid, hydrogen peroxide, and deionized water at a ratio of 1:1:6 to remove impurities such as active metals, metal oxides, and hydroxides on the Si substrate;
[0078] 3) Clean the Si substrate in a mixed solution of hydrofluoric acid and deionized water at a ratio of 1:50 for 30 seconds, then put it in deionized water and let it stand for 1 minute. Repeat this step 5 times to remove the surface of the Si substrate. natural oxides and dangling bonds;
[0079] 4) Dry the cleaned Si subst...
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