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Two-dimensional heterojunction tunneling field effect transistor immunosensor and preparation method thereof

A technology of tunneling field effect and immune sensor, which is applied in the field of two-dimensional heterojunction tunneling field effect transistor immune sensor and its preparation, and can solve the problems of short channel effect and sensitivity limitation of devices

Active Publication Date: 2021-01-05
XI AN JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] In order to solve the above defects in the prior art, the object of the present invention is to provide a two-dimensional heterojunction tunneling field effect transistor immunosensor and its preparation method, which adopts the bottom gate structure of the buried gate metal electrode to solve the current There are sensitivity limitations in FET immune sensors and the problem of short channel effects in the process of device miniaturization

Method used

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  • Two-dimensional heterojunction tunneling field effect transistor immunosensor and preparation method thereof
  • Two-dimensional heterojunction tunneling field effect transistor immunosensor and preparation method thereof
  • Two-dimensional heterojunction tunneling field effect transistor immunosensor and preparation method thereof

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Embodiment 1

[0048] Step 1, providing an insulating substrate and cleaning it, the specific steps are as follows:

[0049] 1) SiO 2 Put the Si substrate in an acetone solution for ultrasonic cleaning, and the cleaning time is 5 minutes. Put the substrate cleaned by acetone into an ethanol solution for ultrasonic cleaning for 5 minutes, and finally rinse it with deionized water for 1 minute to remove the Si substrate. organic material;

[0050] 2) Clean the Si substrate in a mixed solution of hydrochloric acid, hydrogen peroxide, and deionized water at a ratio of 1:1:6 to remove impurities such as active metals, metal oxides, and hydroxides on the Si substrate;

[0051] 3) Clean the Si substrate in a mixed solution of hydrofluoric acid and deionized water at a ratio of 1:50 for 30 seconds, then put it in deionized water and let it stand for 1 minute. Repeat this step 5 times to remove the surface of the Si substrate. natural oxides and dangling bonds;

[0052] 4) Dry the cleaned Si subst...

Embodiment 2

[0075] Step 1, providing an insulating substrate and cleaning it, the specific steps are as follows:

[0076] 1) SiO 2 Put the Si substrate in an acetone solution for ultrasonic cleaning, and the cleaning time is 5 minutes. Put the substrate cleaned by acetone into an ethanol solution for ultrasonic cleaning for 5 minutes, and finally rinse it with deionized water for 1 minute to remove the Si substrate. organic material;

[0077] 2) Clean the Si substrate in a mixed solution of hydrochloric acid, hydrogen peroxide, and deionized water at a ratio of 1:1:6 to remove impurities such as active metals, metal oxides, and hydroxides on the Si substrate;

[0078] 3) Clean the Si substrate in a mixed solution of hydrofluoric acid and deionized water at a ratio of 1:50 for 30 seconds, then put it in deionized water and let it stand for 1 minute. Repeat this step 5 times to remove the surface of the Si substrate. natural oxides and dangling bonds;

[0079] 4) Dry the cleaned Si subst...

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Abstract

The invention discloses a two-dimensional heterojunction tunneling field effect transistor immunosensor and a preparation method thereof. A two-dimensional material with a specific band gap is selected and stacked into a vertical heterojunction as a channel layer, and the energy band structures of the device in an on state and an off state are respectively in staggered arrangement and staggered arrangement through gate voltage control, low current in the off state is realized, and in an on state, large current is obtained due to inter-band tunneling. A buried gate structure is used, and specific antibody protein molecules are used for surface modification on the surface of the heterojunction modulated by gate voltage. A heterojunction is used as an effective detection area and has ideal grid control capability. The dielectric regulation and control of a detection area is detected along with a detection sample by utilizing a plurality of electrical parameters. The sensor provided by theinvention has a steeper subthreshold slope, can realize ultra-high sensitivity detection of biomolecules and save precious clinical specimens, and meanwhile, because the thickness of a two-dimensional material is ultra-thin, the sensor has great advantages in size reduction and is convenient for energy band regulation and control.

Description

technical field [0001] The invention relates to the technical field of biosensing, in particular to a two-dimensional heterojunction tunneling field effect transistor immunosensor and a preparation method thereof. Background technique [0002] Field-effect transistor-based biosensors have received a lot of attention in recent years because of the advantage of label-free electrical measurements. The device is small in size and light in weight, and the chip integration of the sensor and the measurement system is high, which is convenient for mass production at low cost. The gating effect of biomolecules on semiconductors can be directly detected through changes in properties such as current and conductance. As a kind of biosensor, immunosensor is very suitable to obtain significantly better performance than traditional detection methods through the field effect tube structure. In order to achieve the detection of specific molecules, the gate oxide layer on the semiconductor ...

Claims

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Application Information

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IPC IPC(8): H01L29/739H01L29/06H01L29/10H01L29/423H01L21/34H01L21/44G01N33/543G01N33/68
CPCG01N33/5438G01N33/6854H01L21/44H01L29/0684H01L29/1029H01L29/42316H01L29/66969H01L29/7391
Inventor 潘毅柯柯闵泰雷虹吕毅
Owner XI AN JIAOTONG UNIV
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