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Multielement hard coating and electromagnetic enhancement magnetron sputtering preparation process thereof

A hard coating and magnetron sputtering technology, which is applied in metal material coating process, coating, sputtering plating, etc., can solve the problem of poor bonding force, stress accumulation, and low ionization rate of magnetron sputtering particles To achieve the effect of increasing the plasma density, lengthening the motion stroke, and improving the ionization rate

Inactive Publication Date: 2020-08-11
苏州艾钛科纳米科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Existing magnetron sputtering cathodes prepare hard coatings, and its main problems are mainly manifested in the following aspects: First, the deposition efficiency is low, the traditional magnetron sputtering deposition efficiency is low, and the preparation time of hard coatings is long , the production cost is high; the second is that the traditional magnetron sputtering particle ionization rate is low, and the structure is loose; the third is that the gradient layer required by the traditional magnetron sputtering deposition process needs to transition from metal to metal to nonmetal, and the metal to nonmetal layer is multi-level Transition, resulting in stress accumulation, poor bonding

Method used

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  • Multielement hard coating and electromagnetic enhancement magnetron sputtering preparation process thereof
  • Multielement hard coating and electromagnetic enhancement magnetron sputtering preparation process thereof
  • Multielement hard coating and electromagnetic enhancement magnetron sputtering preparation process thereof

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Effect test

Embodiment 1

[0054] Multi-component Hard AlCrWSiN Coating with Single Composite Functional Layer

[0055] The coating equipment configuration of the multi-component hard coating of the single-layer composite coating functional layer is as follows. The electromagnetically enhanced magnetron sputtering cathode 15 used is four groups, of which two groups are equipped with alloy AlCr targets, two groups are equipped with AlCrWSi targets, and four groups The magnetron sputtering cathode 15 is equipped with electromagnetic enhancement coils 12, 14, and the cylindrical central anode 13 is assembled at the center of the top surface of the cavity. During the glow discharge process, electrons will be subjected to the electric field of the anode under the action of the annular closed magnetic field. During the movement of the electrons, they will collide with the process gas and sputtering particles, thereby ionizing the gas and sputtering particles. In this process, the closed magnetic field will gre...

Embodiment 2

[0075] Multi-layer hard coating of multi-layer composite functional layer

[0076] The coating equipment configuration of the multi-component hard coating of the multi-layer composite functional layer is as follows. The electromagnetically enhanced magnetron sputtering cathodes used are four groups, of which two groups are equipped with metal AlCr targets, two groups are equipped with TiSi targets, and four groups of magnetron sputtering cathodes are equipped with The emitter cathode is equipped with an electromagnetic enhancement coil, and the central anode is installed at the center of the upper end of the cavity. During the glow discharge process, electrons will be attracted to the water-cooled anode by the electric field of the anode under the action of the annular closed magnetic field. During the movement, it will collide with the process gas and sputtering particles, thereby ionizing. In this process, the annular closed magnetic field will greatly increase the free path ...

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Abstract

The invention relates to a multielement hard coating and an electromagnetic enhancement magnetron sputtering preparation process thereof. An electromagnetic enhancement magnetron sputtering technologyis characterized by sleeving electromagnetic coils on a magnetron sputtering cathode, using multiple groups of cathode unbalanced magnetic fields for forming a closed magnetic field, forming a crossed electric and magnetic field through the closed magnetic field and a center anode, and improving the ionization rate of sputtered particles. The multielement hard coating comprises an underpainting transition layer, a function layer, and a covering layer. Through electromagnetic enhancement magnetron sputtering, a sputtering area can be increased, a sputtering channel is widened, the magnetic field intensity of the closed magnetic field can be further improved, and the ionization rate of the sputtered particles is favorably improved; and through the closed magnetic field, a free path of an electron is increased, the plasma intensity is improved, the cleaning efficiency and a cleaning effect are improved, and the ionization rate of the sputtered particles can be greatly improved, so that auxiliary deposition is realized, and a binding force of the coating is improved.

Description

technical field [0001] The invention belongs to the technical field of vacuum coating, and relates to a multi-component hard coating and an electromagnetically enhanced magnetron sputtering preparation process thereof. Background technique [0002] Physical vapor deposition (PVD) is the deposition of atoms or molecules from the gas phase onto the surface of a substrate, including evaporation, sputtering deposition, ion plating, pulsed laser deposition, and diffusion coating. Cutting tools, molds, wear-resistant parts, etc., after hard coating by physical vapor deposition, effectively improve their surface hardness, composite toughness, wear resistance and chemical stability, etc., and greatly improve the service life of the workpiece. [0003] At this stage, the surface modification of the tool and mold surface is mainly realized by arc ion plating. Arc ion plating technology is a PVD technology developed by combining evaporation and sputtering technology. In the vacuum cha...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/02C23C14/06
CPCC23C14/352C23C14/022C23C14/024C23C14/0641C23C14/0084
Inventor 郎文昌刘伟刘俊红
Owner 苏州艾钛科纳米科技有限公司
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