Based on amorphous (galu) 2 o 3 Thin-film solar-blind ultraviolet light detector
A detector and ultraviolet light technology, which is applied in the direction of semiconductor devices, sustainable manufacturing/processing, climate sustainability, etc., can solve the problems of reducing the electrical performance and stability of devices, and the degradation of crystal quality, so as to improve the detection ability and reduce the Effect of dark current and faster response speed
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Embodiment 1
[0049] Such as figure 1 As shown, the present embodiment is based on an amorphous (GaLu) 2 o 3 Thin-film sun-blind ultraviolet light detector, the detector includes an m-plane sapphire substrate, an active layer, and a pair of parallel metal electrodes from bottom to top, wherein: the active layer is amorphous (GaLu) 2 o 3 film, the material of the parallel metal electrodes is Au. The thickness of the substrate is 0.43 mm, the thickness of the active layer is 120 nm, the thickness of the parallel metal electrodes is 50 nm, and the distance between the parallel metal electrodes is 10 μm.
[0050] In this embodiment, the above-mentioned amorphous (GaLu) based 2 o 3 The thin-film sun-blind ultraviolet light detector is prepared by the following method, including the following steps:
[0051] Step 1: Preparation by solid phase sintering (GaLu) 2 o 3 Ternary ceramic target
[0052] 1.1 molar ratio Ga 2 o 3 : Lu 2 o 3 =95:5, weigh 8.995g Ga 2 o 3 powder and 1.005g Lu ...
Embodiment 2
[0060] Embodiment 2 (comparative example)
[0061] A single crystal (GaLu) based 2 o 3 Thin-film sun-blind ultraviolet photodetector, the detector includes c-plane sapphire substrate, active layer, and a pair of parallel metal electrodes from bottom to top, wherein: the active layer is (GaLu) 2 o 3 thin film, the material of the parallel metal electrodes is Au, the thickness of the substrate is 0.43 mm, the thickness of the active layer is 150 nm, the thickness of the parallel metal electrodes is 55 nm, and the distance between the parallel metal electrodes is 10 μm .
[0062] In this embodiment, the above-mentioned single crystal (GaLu) based 2 o 3 The thin-film sun-blind ultraviolet light detector is prepared by the following method, including the following steps:
[0063] Step 1: (GaLu) prepared by the same solid phase sintering method as in Example 1 2 o 3 Ternary ceramic target
[0064] Step 2 utilizes (GaLu) 2 o 3 Preparation of solar-blind ultraviolet light d...
Embodiment 3
[0069] Embodiment 3 (comparative example)
[0070] A β-Ga based 2 o 3 Thin-film sun-blind ultraviolet light detector, the detector includes a c-plane sapphire substrate, an active layer, and a pair of parallel metal electrodes from bottom to top, wherein: the active layer is β-Ga 2 o 3 thin film, the material of the parallel metal electrodes is Au, the thickness of the substrate is 0.43 mm, the thickness of the active layer is 150 nm, the thickness of the parallel metal electrodes is 55 nm, and the distance between the parallel metal electrodes is 10 μm.
[0071] The above-mentioned β-Ga-based 2 o 3 The thin-film sun-blind ultraviolet light detector is prepared by the following method, including the following steps:
[0072] Step 1: Preparation of Ga by sintering by solid phase sintering method 2 o 3 Ceramic target
[0073] 1.1 Weigh 10g Ga 2 o 3 Powder, add 15g of deionized water, then place in the ball mill jar (the ball milling medium is zirconia ceramic balls) i...
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